Micro-Raman spectroscopy stress measurement method for porous silicon film

2010 ◽  
Vol 48 (11) ◽  
pp. 1119-1125 ◽  
Author(s):  
Qiu Li ◽  
Wei Qiu ◽  
Haoyun Tan ◽  
Jiangang Guo ◽  
Yilan Kang
Keyword(s):  
Raman Spectroscopy ◽  
Porous Silicon ◽  
Measurement Method ◽  
Stress Measurement ◽  
Silicon Film ◽  
Micro Raman Spectroscopy

An Experimental Analysis of Residual Stress Measurements in Porous Silicon Using Micro-Raman Spectroscopy

2004 ◽  
Vol 21 (2) ◽  
pp. 403-405 ◽  
Author(s):  
Lei Zhen-Kun ◽  
Kang Yi-Lan ◽  
Hu Ming ◽  
Qiu Yu ◽  
Xu Han ◽  
...  
Keyword(s):  
Residual Stress ◽  
Raman Spectroscopy ◽  
Porous Silicon ◽  
Experimental Analysis ◽  
Stress Measurements ◽  
Micro Raman Spectroscopy

Residual stress measurement in a metal microdevice by micro Raman spectroscopy

2017 ◽  
Vol 27 (10) ◽  
pp. 105014 ◽  
Author(s):  
Chang Song ◽  
Liqun Du ◽  
Leijie Qi ◽  
Yu Li ◽  
Xiaojun Li ◽  
...  
Keyword(s):  
Residual Stress ◽  
Raman Spectroscopy ◽  
Stress Measurement ◽  
Residual Stress Measurement ◽  
Micro Raman Spectroscopy

scholarly journals Micro-Raman Scattering of Nanoscale Silicon in Amorphous and Porous Silicon

2017 ◽  
Vol 231 (9) ◽  
Author(s):  
Sangeetha Periasamy ◽  
Sasirekha Venkidusamy ◽  
Ragavendran Venkatesan ◽  
Jeyanthinath Mayandi ◽  
Joshua Pearce ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Porous Silicon ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silicon Nanostructures ◽  
Micro Raman Spectroscopy ◽  
Nanostructured Silicon ◽  
Quartz Substrates

Abstract:The size effect of nanoscale silicon in both amorphous and porous silicon was investigated with micro-Raman spectroscopy. Silicon nanostructures in amorphous silicon were deposited on quartz substrates by plasma enhanced chemical vapor deposition (PECVD) with deposition powers of 15, 30 and 50 W. Micro-Raman spectra of the nanostructured silicon show the T

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