Synthesis and self-assembly of high molecular weight polystyrene-block-poly[2-(N-morpholino)ethyl methacrylate]: A story about microphase separation, amphiphilicity, and stimuli-responsivity

Polymer ◽  
2016 ◽  
Vol 107 ◽  
pp. 357-367 ◽  
Author(s):  
Steffen Eggers ◽  
Felix Lauterbach ◽  
Volker Abetz
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Self Assembly ◽  
Microphase Separation ◽  
Ethyl Methacrylate

Expanding the morphology library of block copolymer self-assemblies with clews of tubules

2017 ◽  
Vol 53 (36) ◽  
pp. 5005-5008 ◽  
Author(s):  
Xiao-Li Sun ◽  
Dong-Ming Liu ◽  
Pan Wang ◽  
Jia-Lin Tan ◽  
Kang-Kang Li ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
High Asymmetry ◽  
Very High

Clews of tubules are reported via block copolymer self-assembly of P4VP-b-PS with both high asymmetry and very high molecular weight.

scholarly journals Giant Gyroid and Templates from High-Molecular-Weight Block Copolymer Self-assembly

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Sungmin Park ◽  
Yeongsik Kim ◽  
Hyungju Ahn ◽  
Jong Hak Kim ◽  
Pil J. Yoo ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly

Synthesis, characterization and aqueous self-assembly of octenylsuccinic corn dextrin ester with high molecular weight

2014 ◽  
Vol 41 ◽  
pp. 250-256 ◽  
Author(s):  
Dandan Lei ◽  
Jia Liu ◽  
Fayin Ye ◽  
Fang Chen ◽  
Guohua Zhao
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Self Assembly

Chemical vapour deposition of soluble poly(p-xylylene) copolymers with tuneable properties

2016 ◽  
Vol 7 (1) ◽  
pp. 54-62 ◽  
Author(s):  
Ilka E. Paulus ◽  
Markus Heiny ◽  
V. Prasad Shastri ◽  
Andreas Greiner
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Ethyl Methacrylate ◽  
High Molecular Weight Poly ◽  
Soluble Poly

High-molecular weight poly(p-xylylene) (PPX)/2-hydroxy-ethyl methacrylate (HEMA) copolymers are synthesized by chemical vapour deposition. The copolymer coatings are hydrophilic and show good cytocompatibility.

Formation of 12-nm Nanodot Pattern by Block Copolymer Self-Assembly Technique

2011 ◽  
Vol 497 ◽  
pp. 122-126 ◽  
Author(s):  
Miftakhul Huda ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Molecular Weight ◽  
Quantum Dot ◽  
Self Assembly ◽  
Microphase Separation ◽  
Experimental Result ◽  
Storage Device ◽  
Pdms Layer ◽  
Pdms Film ◽  
Assembly Technique ◽  
Total Molecular Weight

In this work, we studied the fabrication of 12-nm-size nanodot pattern by self-assembly technique using high-etching-selectivity poly (styrene)-poly (dimethyl-siloxane) (PS-PDMS) block copolymers. The necessary etching duration for removing the very thin top PDMS layer is unexpectedly longer when the used molecular weight of PS-PDMS is 13.5-4.0 kg/mol (17.5 kg/mol total molecular weight) than that of 30.0-7.5 kg/mol (37.5 kg/mol total molecular weight). From this experimental result, it was clear that PS-PDMS with lower molecular weight forms thicker PDMS layer on the air/polymer interface of PS-PDMS film after microphase separation process. The 22-nm pitch of nanodot pattern by self-assembly holds the promise for the low-cost and high-throughput fabrication of 1.3 Tbit/inch2storage device. Nanodot size of 12 nm also further enhances the quantum-dot effect in quantum-dot solar cell.

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