Chemical vapour deposition of soluble poly(p-xylylene) copolymers with tuneable properties

2016 ◽  
Vol 7 (1) ◽  
pp. 54-62 ◽  
Author(s):  
Ilka E. Paulus ◽  
Markus Heiny ◽  
V. Prasad Shastri ◽  
Andreas Greiner
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Ethyl Methacrylate ◽  
High Molecular Weight Poly ◽  
Soluble Poly

High-molecular weight poly(p-xylylene) (PPX)/2-hydroxy-ethyl methacrylate (HEMA) copolymers are synthesized by chemical vapour deposition. The copolymer coatings are hydrophilic and show good cytocompatibility.

scholarly journals A rugged, self-sterilizing antimicrobial copper coating on ultra-high molecular weight polyethylene: a preliminary study on the feasibility of an antimicrobial prosthetic joint material

2019 ◽  
Vol 7 (20) ◽  
pp. 3310-3318 ◽  
Author(s):  
Ke Wu ◽  
Samuel P. Douglas ◽  
Gaowei Wu ◽  
Alexander J. MacRobert ◽  
Elaine Allan ◽  
...  
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Copper Coating ◽  
Prosthetic Joint ◽  
Preliminary Study ◽  
First Time ◽  
Ultra High Molecular Weight ◽  
Joint Material

We report here for the first time how a copper coating bond to ultra-high molecular weight polyethylene (UHMWPE) via low temperature aerosol assisted chemical vapour deposition.

Comparison of wear of ultra-high molecular weight polyethylene acetabular cups against surface-engineered femoral heads

2008 ◽  
Vol 222 (7) ◽  
pp. 1073-1080 ◽  
Author(s):  
A Galvin ◽  
C Brockett ◽  
S Williams ◽  
P Hatto ◽  
A Burton ◽  
...  
Keyword(s):  
Molecular Weight ◽  
High Molecular Weight ◽  
Hip Joint ◽  
Vapour Deposition ◽  
Polyethylene Wear ◽  
Chemical Vapour ◽  
Alumina Ceramic ◽  
Femoral Heads ◽  
Ultra High Molecular Weight ◽  
Hip Joint Simulator

Alumina ceramic heads have been previously shown to reduce polyethylene wear in comparison to cobalt chrome (CoCr) heads in artificial hip joints. However, there are concerns about the brittle nature of ceramics. It is therefore of interest to investigate ceramic-like coatings on metallic heads. The aim of this study was to compare the friction and wear of ultra-high molecular weight polyethylene (UHMWPE) against alumina ceramic, CoCr, and surface-engineered ceramic-like coatings in a friction simulator and a hip joint simulator. All femoral heads tested were 28 mm diameter and included: Biolox™ Forte alumina, CoCr, arc evaporative physical vapour deposition (AEPVD) chromium nitride (CrN) coated CoCr, plasma-assisted chemical vapour deposition (PACVD) amorphous diamond-like carbon (aDLC) coated CoCr, sputter CrN coated CoCr, reactive gas controlled arc (RGCA) AEPVD titanium nitride (TiN) coated CoCr, and Graphit-iC™ coated CoCr. These were articulated against UHMWPE acetabular cups in a friction simulator and a hip joint simulator. Alumina and CoCr gave the lowest wear volumes whereas the sputter coated CrN gave the highest. Alumina also had the lowest friction factor. There was an association between surface parameters and wear. This study indicates that surface topography of surface-engineered femoral heads is more important than friction and wettability in controlling UHMWPE wear.

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-395-Pr8-402 ◽  
Author(s):  
B. Armas ◽  
M. de Icaza Herrera ◽  
C. Combescure ◽  
F. Sibieude ◽  
D. Thenegal
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Cold Wall ◽  
Pressure Chemical ◽  
Mullite Coatings

Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-373-Pr8-380 ◽  
Author(s):  
P. Sourdiaucourt ◽  
A. Derré ◽  
P. Delhaès ◽  
P. David
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hafnium Carbide ◽  
Experimental Conditions

Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum

2020 ◽  
Author(s):  
Polla Rouf ◽  
Pitsiri Sukkaew ◽  
Lars Ojamäe ◽  
Henrik Pedersen
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Aluminium Nitride ◽  
Methyl Groups ◽  
Time Resolved ◽  
Thermally Induced ◽  
Light Emitting ◽  
Carbon Impurities ◽  
Wide Range

<p>Aluminium nitride (AlN) is a semiconductor with a wide range of applications from light emitting diodes to high frequency transistors. Electronic grade AlN is routinely deposited at 1000 °C by chemical vapour deposition (CVD) using trimethylaluminium (TMA) and NH<sub>3</sub> while low temperature CVD routes to high quality AlN are scarce and suffer from high levels of carbon impurities in the film. We report on an ALD-like CVD approach with time-resolved precursor supply where thermally induced desorption of methyl groups from the AlN surface is enhanced by the addition of an extra pulse, H<sub>2</sub>, N<sub>2</sub> or Ar between the TMA and NH<sub>3</sub> pulses. The enhanced desorption allowed deposition of AlN films with carbon content of 1 at. % at 480 °C. Kinetic- and quantum chemical modelling suggest that the extra pulse between TMA and NH<sub>3</sub> prevents re-adsorption of desorbing methyl groups terminating the AlN surface after the TMA pulse. </p>

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