This paper presents a surface plasmon interference lithography technique based on the complementary grating, which comprises silicon gratings and complementary aluminum grating masks, for fabricating subwavelength structures. In this theoretical study, the optimal parameters of the complementary grating structure were determined using the reflectance spectrum. The optical field distributions of one- and two-dimensional subwavelength structures were obtained using the finite-difference time-domain method and rotation-related formulas. The results of numerical evaluations show that a one-dimensional periodic structure with a half-pitch resolution of 60.5 nm (approximately [Formula: see text]/6.7) can be fabricated. In addition, subwavelength structures can be diversified using different rotation methods to expose the photolithography samples, such as square dot arrays and quasi-hexagonal closely packed structures. The proposed method combines surface plasmon interference with sample rotation, thereby enabling fabrication of abundant subwavelength structures.
Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography
