Optical emission spectroscopy measurement of plasma parameters in a nanosecond pulsed spark discharge for CO2/CH4 dry reforming

Author(s):  
Shuai Zhang ◽  
Xin Zeng ◽  
Han Bai ◽  
Cheng Zhang ◽  
Tao Shao
Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.


2013 ◽  
Vol 770 ◽  
pp. 245-248 ◽  
Author(s):  
Kanchaya Honglertkongsakul

Argon plasma jet in a single-electrode configuration was generated at low temperature and atmospheric pressure by 50 kHz radiofrequency power supply. Optical Emission Spectroscopy (OES) was used to investigate the local emissivity of argon plasma in the range between 200 and 1,100 nm. The spatial distribution of reactive species was measured at different distances of the plasma expansion from the nozzle exit such as 0.0, 0.5, 1.0, 1.5, 2.0, 2.5 and 3.0 cm. These measurements were obtained to analyze the plasma parameters such as electron temperature and electron density. The effect of distances of the plasma expansion from the nozzle exit on the plasma parameters was studied. The main intensive argon lines were found in the region between 690 and 970 nm. The electron temperature was found in the range of 0.5-1.1 eV. The electron density was found in the range of 4.0x1012-1.2x1013 cm-3. The plasma parameters strongly depended on the distances of the plasma expansion from the nozzle exit.


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