Nondestructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry

2004 ◽  
Vol 59 (8) ◽  
pp. 1243-1249 ◽  
Author(s):  
G. Pepponi ◽  
C. Streli ◽  
P. Wobrauschek ◽  
N. Zoeger ◽  
K. Luening ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Ray ◽  
Dose Determination ◽  
Ultrashallow Junctions ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion
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