Directly correlated transmission electron microscopy and atom probe tomography of grain boundary oxidation in a Ni–Al binary alloy exposed to high-temperature water

2013 ◽  
Vol 69 (7) ◽  
pp. 509-512 ◽  
Author(s):  
D.K. Schreiber ◽  
M.J. Olszta ◽  
S.M. Bruemmer
2013 ◽  
Vol 19 (S2) ◽  
pp. 970-971 ◽  
Author(s):  
D.K. Schreiber ◽  
M.J. Olszta ◽  
S.M. Bruemmer

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.


2017 ◽  
Vol 23 (2) ◽  
pp. 291-299 ◽  
Author(s):  
Andreas Stoffers ◽  
Juri Barthel ◽  
Christian H. Liebscher ◽  
Baptiste Gault ◽  
Oana Cojocaru-Mirédin ◽  
...  

AbstractIn the course of a thorough investigation of the performance-structure-chemistry interdependency at silicon grain boundaries, we successfully developed a method to systematically correlate aberration-corrected scanning transmission electron microscopy and atom probe tomography. The correlative approach is conducted on individual APT and TEM specimens, with the option to perform both investigations on the same specimen in the future. In the present case of a Σ9 grain boundary, joint mapping of the atomistic details of the grain boundary topology, in conjunction with chemical decoration, enables a deeper understanding of the segregation of impurities observed at such grain boundaries.


2019 ◽  
Vol 55 (6) ◽  
pp. 1382-1403 ◽  
Author(s):  
Josiah B. Lewis ◽  
Christine Floss ◽  
Dieter Isheim ◽  
Tyrone L. Daulton ◽  
David N. Seidman ◽  
...  

1990 ◽  
Vol 183 ◽  
Author(s):  
J. L. Batstone

AbstractMotion of ordered twin/matrix interfaces in films of silicon on sapphire occurs during high temperature annealing. This process is shown to be thermally activated and is analogous to grain boundary motion. Motion of amorphous/crystalline interfaces occurs during recrystallization of CoSi2 and NiSi2 from the amorphous phase. In-situ transmission electron microscopy has revealed details of the growth kinetics and interfacial roughness.


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