H2–CH4 mixed gas plasma treatment on LP-MOCVD ZnO:B for amorphous silicon thin film solar cells

2013 ◽  
Vol 116 ◽  
pp. 231-237 ◽  
Author(s):  
Li Wang ◽  
Xiaodan Zhang ◽  
Xu Yang ◽  
Changchun Wei ◽  
Xinliang Chen ◽  
...  
2011 ◽  
Vol 11 (1) ◽  
pp. S12-S16 ◽  
Author(s):  
Fang-Hsing Wang ◽  
Hung-Peng Chang ◽  
Chih-Chung Tseng ◽  
Chia-Cheng Huang ◽  
Han-Wen Liu

2011 ◽  
Vol 57 (1) ◽  
pp. 73-75 ◽  
Author(s):  
M.C. Wang ◽  
T.C. Chang ◽  
S.W. Tsao ◽  
Y.Z. Chen ◽  
S.C. Tseng ◽  
...  

2019 ◽  
Vol 27 (24) ◽  
pp. 34542 ◽  
Author(s):  
Meiwei Kong ◽  
Jiaming Lin ◽  
Chun Hong Kang ◽  
Chao Shen ◽  
Yujian Guo ◽  
...  

2014 ◽  
Vol 44 ◽  
pp. 203-208 ◽  
Author(s):  
Cordula Walder ◽  
Alex Neumüller ◽  
Oleg Sergeev ◽  
Martin Kellermann ◽  
Karsten von Maydell ◽  
...  

2014 ◽  
Vol 211 (7) ◽  
pp. 1493-1498 ◽  
Author(s):  
Yang Doo Kim ◽  
Kang-Soo Han ◽  
Ju-Hyeon Shin ◽  
Joong-Yeon Cho ◽  
Chan Im ◽  
...  

2009 ◽  
Vol 517 (12) ◽  
pp. 3575-3577 ◽  
Author(s):  
Fernando Villar ◽  
Aldrin Antony ◽  
Jordi Escarré ◽  
Daniel Ibarz ◽  
Rubén Roldán ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document