Thermal stability of tungsten nitride films deposited by reactive magnetron sputtering

2008 ◽  
Vol 202 (10) ◽  
pp. 2169-2175 ◽  
Author(s):  
S.H. Mohamed
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tungsten Nitride ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Study of the thermal stability of carbon nitride thin films prepared by reactive magnetron sputtering

2000 ◽  
Vol 9 (2) ◽  
pp. 212-218 ◽  
Author(s):  
C. Fernández-Ramos ◽  
M.J. Sayagués ◽  
T.C. Rojas ◽  
M.D. Alcalá ◽  
C. Real ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Carbon Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering

2010 ◽  
Vol 257 (3) ◽  
pp. 1058-1062 ◽  
Author(s):  
J. Musil ◽  
J. Blažek ◽  
P. Zeman ◽  
Š. Prokšová ◽  
M. Šašek ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Al2o3 Phase ◽  
Thermal Stability Of

Thermal Stability of TiZrAlN and TiZrSiN Films Formed by Reactive Magnetron Sputtering

2018 ◽  
Vol 9 (3) ◽  
pp. 418-426 ◽  
Author(s):  
G. Abadias ◽  
A. Yu. Daniliuk ◽  
I. A. Solodukhin ◽  
V. V. Uglov ◽  
S. V. Zlotsky
Keyword(s):  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Thermal Stability Of

scholarly journals Investigation of reactively sputtered TaN thin-film resistors for microwave photonic applications

2021 ◽  
pp. 93-98
Author(s):  
Evgenii Erofeev ◽  
Egor Polyntsev ◽  
Sergei Ishutkin
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Magnetron Sputtering ◽  
Electrical Resistance ◽  
High Thermal Stability ◽  
Tantalum Nitride ◽  
Reactive Magnetron ◽  
Microwave Photonic ◽  
Thin Film Resistors ◽  
Thermal Stability Of

Electrophysical characteristics and their thermal stability of thin-film resistors based on tantalum nitride (TaN) obtained by reactive magnetron sputtering were investigated. The optimal modes of the magnetron sputtering process are determined, ensuring the Ta2N phase film composition with the value of the specific electrical resistance of 250 μm cm and high thermal stability of the parameters. On the basis of the investigations carried out, thin-film matching resistors were manufactured for use as part of an electro-optical InP-based MZ modulator

Microstructural and Mechanical Properties of Nanostructured Tungsten Nitride Thin Films Prepared by RF Reactive Magnetron Sputtering

2018 ◽  
Vol 24 (8) ◽  
pp. 5872-5876
Author(s):  
G Balakrishnan ◽  
V Sathiyaraj ◽  
M Dinesh ◽  
P. Naveen Chandran ◽  
C Thamotharan
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Nitrogen Content ◽  
High Hardness ◽  
Reactive Magnetron Sputtering ◽  
Tungsten Nitride ◽  
Reactive Magnetron ◽  
Microstructural Property ◽  
Steel Substrates

In the present work, nanostructured tungsten nitride (WN) thin films were deposited by RF reactive magnetron sputtering technique in a mixture of N2 and Argon atmosphere and its microstructure and mechanical properties were investigated. The Argon pressure was kept constant at 20 sccm, while the N2 partial pressures were varied (3%, 5%, 10% and 15%). The WN thin films are deposited on SS304 stainless steel substrates at a temperature of 500 °C. The microstructural property was analyzed using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) and mechanical properties were evaluated by nanoindentation technique. The XRD studies indicated the formation of different phases as a function of nitrogen content. The hardness and the young’s modulus values were in the range 27–39 GPa and 239–280 GPa, respectively. The high hardness values correspond to the coatings with the low nitrogen content and vice-versa. The mechanical properties of the tungsten nitride coatings were strongly influenced by the microstructure.

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