Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering
2010 ◽
Vol 257
(3)
◽
pp. 1058-1062
◽
2000 ◽
Vol 9
(2)
◽
pp. 212-218
◽
High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)
◽
2015 ◽
Vol 19
(2)
◽
pp. 105-112
2010 ◽
Vol 56
(4)
◽
pp. 1176-1179
◽
2008 ◽
Vol 202
(10)
◽
pp. 2169-2175
◽
2014 ◽
Vol 245
◽
pp. 34-39
◽
2017 ◽
Vol 485
◽
pp. 1-7
◽
2018 ◽
Vol 9
(3)
◽
pp. 418-426
◽
1999 ◽
Vol 120-121
◽
pp. 200-205
◽
Keyword(s):
Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
◽
pp. 1287-1292
◽