Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing

2008 ◽  
Vol 202 (22-23) ◽  
pp. 5242-5245 ◽  
Author(s):  
Kyong Nam Kim ◽  
Jong Hyeuk Lim ◽  
Jung Kyun Park ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Flat Panel Display ◽  
Large Area ◽  
Flat Panel ◽  
Inductively Coupled

Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing

2009 ◽  
Vol 29 (4) ◽  
pp. 251-259 ◽  
Author(s):  
Jong Hyeuk Lim ◽  
Kyong Nam Kim ◽  
Gwang Ho Gweon ◽  
Jae Beom Park ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Scale ◽  
Plasma Source ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Inductively Coupled

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

2008 ◽  
Vol 92 (5) ◽  
pp. 051504 ◽  
Author(s):  
Jong Hyeuk Lim ◽  
Kyong Nam Kim ◽  
Jung Kyun Park ◽  
Jong Tae Lim ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Linear Type ◽  
Inductively Coupled

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

Characteristics of Inductively Coupled Plasma using Internal Double Comb-type Antenna for Flat Panel Display Processing

2007 ◽  
Vol 46 (No. 48) ◽  
pp. L1216-L1218 ◽  
Author(s):  
Jong Hyeuk Lim ◽  
Kyong Nam Kim ◽  
Jung Kyun Park ◽  
Jae Hun Park ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Inductively Coupled
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