Mass spectrometric study of discharges produced by a large-area dual-frequency–dual-antenna inductively coupled plasma source

2012 ◽  
Vol 45 (47) ◽  
pp. 475201 ◽  
Author(s):  
Anurag Mishra ◽  
Tae Hyung Kim ◽  
Kyong Nam Kim ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Mass Spectrometric Study ◽  
Plasma Source ◽  
Mass Spectrometric ◽  
Spectrometric Study ◽  
Dual Frequency ◽  
Large Area ◽  
Inductively Coupled

Inductively coupled plasma mass spectrometric study of laser sputtering from the surface of an Al–Cu–Fe alloy and quasicrystal

2002 ◽  
Vol 186 (1-4) ◽  
pp. 322-328 ◽  
Author(s):  
Aldo Mele ◽  
Haichen Liu ◽  
Richard E. Russo ◽  
Xianglei Mao ◽  
Anna Giardini ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Mass Spectrometric Study ◽  
Mass Spectrometric ◽  
Spectrometric Study ◽  
Inductively Coupled

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

Model for a large area multi‐frequency multiplanar coil inductively coupled plasma source

1996 ◽  
Vol 14 (5) ◽  
pp. 2859-2870 ◽  
Author(s):  
Naoki Yamada ◽  
Peter L. G. Ventzek ◽  
H. Date ◽  
Y. Sakai ◽  
H. Tagashira
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Large Area ◽  
Inductively Coupled

scholarly journals Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source

1996 ◽  
Vol 421 ◽  
Author(s):  
C. Constantine ◽  
D. Johnson ◽  
C. Barratt ◽  
R. J. Shul ◽  
G. B. Mcclellan ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Inductively Coupled Plasma ◽  
Electron Cyclotron Resonance ◽  
Plasma Source ◽  
Large Area ◽  
Inductively Coupled ◽  
Semiconductor Etching ◽  
Deposition Processes ◽  
Gan Etching ◽  
Very High

AbstractInductively Coupled Plasma (ICP) sources are extremely promising for large-area, highion density etching or deposition processes. In this review we compare results for GaAs and GaN etching with both ICP and Electron Cyclotron Resonance (ECR) sources on the same singlewafer platform. The ICP is shown to be capable of very high rates with excellent anisotropy for fabrication of GaAs vias or deep mesas in GaAs or GaN waveguide structures.

Properties of an Internal U-Shaped Inductively Coupled Plasma Source Operated by Superimposed Dual Frequency

2018 ◽  
Vol 46 (9) ◽  
pp. 3159-3164
Author(s):  
Do Han Kim ◽  
Tae Hyung Kim ◽  
Soo Jung Lee ◽  
Won Oh Lee ◽  
Kyong Nam Kim ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Dual Frequency ◽  
Inductively Coupled
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