The Spatial Effects of Antenna Configuration in a Large Area Inductively Coupled Plasma System for Flat Panel Displays

2014 ◽  
Vol 16 (8) ◽  
pp. 758-766 ◽  
Author(s):  
Seon-Geun Oh ◽  
Young-Jun Lee ◽  
Jae-Hong Jeon ◽  
Jong-Hyeon Seo ◽  
Hee-Hwan Choe
Keyword(s):  
Inductively Coupled Plasma ◽  
Flat Panel Displays ◽  
Spatial Effects ◽  
Large Area ◽  
Flat Panel ◽  
Plasma System ◽  
Inductively Coupled ◽  
Antenna Configuration

Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System

2010 ◽  
Vol 38 (2) ◽  
pp. 133-136 ◽  
Author(s):  
Kyong Nam Kim ◽  
Jong Hyeuk Lim ◽  
Woong Sun Lim ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Plasma System ◽  
Inductively Coupled ◽  
Internal Antenna

Antenna configuration for uniform large-area inductively coupled plasma production

2000 ◽  
Vol 77 (4) ◽  
pp. 492-494 ◽  
Author(s):  
S. S. Kim ◽  
H. Y. Chang ◽  
C. S. Chang ◽  
N. S. Yoon
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Plasma Production ◽  
Inductively Coupled ◽  
Antenna Configuration

Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask

2018 ◽  
Vol 663 ◽  
pp. 21-24 ◽  
Author(s):  
Se Jun Park ◽  
Dohyung Kim ◽  
Seungmoo Lee ◽  
Yongjoon Ha ◽  
Mingyoo Lim ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Inductively Coupled Plasma ◽  
Carbon Layer ◽  
Next Generation ◽  
Plasma System ◽  
Layer Film ◽  
Hard Mask ◽  
Inductively Coupled ◽  
Amorphous Carbon Layer

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

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