Preparation and performance of chemical vapor deposition diamond coatings synthesized onto the cemented carbide micro-end mills with a SiC interlayer

2015 ◽  
Vol 261 ◽  
pp. 272-277 ◽  
Author(s):  
Hongjun Hei ◽  
Jing Ma ◽  
Xiaojing Li ◽  
Shengwang Yu ◽  
Bin Tang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Cemented Carbide ◽  
Chemical Vapor Deposition Diamond ◽  
Diamond Coatings ◽  
End Mills ◽  
And Performance

Effects of CH4 Concentration on CVD Diamond Coatings Deposited on Cemented Carbide Cutting Cools

2006 ◽  
Vol 532-533 ◽  
pp. 480-483 ◽  
Author(s):  
Wen Zhuang Lu ◽  
Dun Wen Zuo ◽  
Min Wang ◽  
Feng Xu
Keyword(s):  
Residual Stress ◽  
Surface Roughness ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Great Influence ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Cemented Carbide ◽  
Diamond Coatings ◽  
Ch4 Concentration

Chemical vapor deposition (CVD) diamond coatings were deposited on cemented carbide cutting cools by an electron-assisted hot filament chemical vapor deposition (EACVD) equipment developed by the authors. The CVD diamond coatings were studied by Scanning Electron Microscope (SEM) and Raman Scattering Spectroscopy (Raman). The experimental results show that CH4 concentration in the source gas performs great influence on the micro-structure, surface roughness, composition, residual stress and adhesion of the CVD diamond coatings. The increase of CH4 concentration results the change of diamond crystal from {111} orientation to {100} orientation, the decrease of the surface roughness and the increase of sp2 carbon in the CVD diamond coatings. A residual compressive stress exists in the CVD diamond coatings. The residual stress decreases with increasing CH4 concentration. A higher or lower CH4 concentration tends to reduce adhesion stress of the continuous CVD diamond coatings.

Growth and characterization of multilayer hot-filament chemical vapor deposition diamond coatings on WC–Co substrates

2019 ◽  
Vol 7 (1) ◽  
pp. 36-43 ◽  
Author(s):  
José Vieira ◽  
André Contin ◽  
Mariana Amorim Fraga ◽  
Evaldo José Corat ◽  
Vladimir Trava Airoldi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Diamond Coatings ◽  
Hot Filament

Examination of the material properties and performance of thin-diamond film cutting tool inserts produced by arc-jet and hot filament chemical vapor deposition

1996 ◽  
Vol 11 (7) ◽  
pp. 1765-1775 ◽  
Author(s):  
James M. Olson ◽  
Michael J. Dawes
Keyword(s):  
Wear Resistance ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Cutting Tool ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
And Performance ◽  
Hot Filament

Thin diamond film coated WC-Co cutting tool inserts were produced using arc-jet and hot-filament chemical vapor deposition. The diamond films were characterized using SEM, XRD, and Raman spectroscopy to examine crystal structure, fracture mode, thickness, crystalline orientation, diamond quality, and residual stress. The performance of the tools was evaluated by comparing the wear resistance of the materials to brazed polycrystalline diamond-tipped cutting tool inserts (PCD) while machining A390 aluminum (18% silicon). Results from the experiments carried out in this study suggest that the wear resistance of the thin diamond films is primarily related to the grain boundary strength, crystal orientation, and the density of microdefects in the diamond film.

scholarly journals Electron and hole drift velocity in chemical vapor deposition diamond

2011 ◽  
Vol 109 (6) ◽  
pp. 063719 ◽  
Author(s):  
Markus Gabrysch ◽  
Saman Majdi ◽  
Daniel J. Twitchen ◽  
Jan Isberg
Keyword(s):  
Chemical Vapor Deposition ◽  
Drift Velocity ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond
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