Effect of scandium content on structure and piezoelectric properties of AlScN films deposited by reactive pulse magnetron sputtering

2017 ◽  
Vol 309 ◽  
pp. 417-422 ◽  
Author(s):  
Olaf Zywitzki ◽  
Thomas Modes ◽  
Stephan Barth ◽  
Hagen Bartzsch ◽  
Peter Frach
Keyword(s):  
Magnetron Sputtering ◽  
Piezoelectric Properties ◽  
Pulse Magnetron ◽  
Scandium Content ◽  
Reactive Pulse

Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

2014 ◽  
Vol 951 ◽  
pp. 104-108
Author(s):  
Xing Fa Zi ◽  
Rui Ming Liu ◽  
Qing Ye ◽  
Xin Zhu Shu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rate Ratio ◽  
Room Temperature ◽  
Single Phase ◽  
Optical Band Gap ◽  
Flow Rate Ratio ◽  
Pulse Magnetron ◽  
Sputtering Power ◽  
Reactive Pulse

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target. Crystalline phases of thin films were controlled by adjusting N2/ O2flow rate ratio and sputtering power precisely during the sputtering process, and the single phase of Cu2O(111) thin films were obtained at room temperature. The thin films deposited at different sputtering powers were characteristics of 2D growth and the root mean square (RMS) of surface roughness of thin films gradually increased with the increasing of sputtering power. The optical band gap (Eg) of thin films were in the range 2.18-2.35 eV, and slightly decreased with increasing of sputtering power from 45 W to 90 W.

Effects of Substrate Temperature on Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

2014 ◽  
Vol 540 ◽  
pp. 25-29
Author(s):  
Xing Fa Zi ◽  
Wen Yang ◽  
Peng Zhi Yang ◽  
Rui Ming Liu ◽  
Xin Zhu Shu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Atmosphere Effect ◽  
Pulse Magnetron ◽  
Vis Spectroscopy ◽  
Structure Surface ◽  
Substrate Temperatures ◽  
Reactive Pulse

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target in a mixture of N2、O2and Ar atmosphere. Effect of substrate temperature on structure, surface morphology and optical properties of thin films were investigated by XRD, AFM and UV-Vis spectroscopy. The results showed that the single-phase of Cu2O(111) thin films were grown for substrate temperature < 200°C. The thin films deposited under different substrate temperatures are characteristics of 2D growth. Moreover,the optical band gap Egof thin film was in the range 2.54-2.58eV, and slightly decreased with increasing of substrate temperatures from RT to 400°C.

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

2004 ◽  
Vol 180-181 ◽  
pp. 538-543 ◽  
Author(s):  
O. Zywitzki ◽  
T. Modes ◽  
H. Sahm ◽  
P. Frach ◽  
K. Goedicke ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Structure And Properties ◽  
Oxide Layers ◽  
Pulse Magnetron ◽  
Reactive Pulse

Silicon oxynitride rugate filters grown by reactive pulse magnetron sputtering

2004 ◽  
Author(s):  
Hagen Bartzsch ◽  
Stephan Lange ◽  
Peter Frach ◽  
Klaus Goedicke
Keyword(s):  
Magnetron Sputtering ◽  
Silicon Oxynitride ◽  
Pulse Magnetron ◽  
Reactive Pulse

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

2005 ◽  
Vol 200 (1-4) ◽  
pp. 967-971 ◽  
Author(s):  
D. Glöß ◽  
P. Frach ◽  
O. Zywitzki ◽  
T. Modes ◽  
S. Klinkenberg ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Pulse Magnetron ◽  
Titanium Dioxide Thin Films ◽  
Reactive Pulse
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