An improved matrix separation method for characterization of ultrapure germanium (8N)

Talanta ◽  
2016 ◽  
Vol 159 ◽  
pp. 14-22 ◽  
Author(s):  
M.A. Reddy ◽  
R. Shekhar ◽  
Sunil Jai Kumar
2020 ◽  
Author(s):  
Devon Holst ◽  
Aleksa Dovijarski ◽  
Alan Lough ◽  
Timothy Paul Bender

The synthesis of axially brominated boron subnaphthalocyanine (BsubNc) was investigated using BBr3 as the Lewis acid source. Random bay position bromination was found to occur as previously described by our...


2010 ◽  
Vol 154-155 ◽  
pp. 34-37
Author(s):  
Mei Fa Huang ◽  
Xiong Cheng ◽  
Guang Qian ◽  
Jiang Tai Huang ◽  
Jing Zhang ◽  
...  

With the development of science and technology, the higher and higher surface accuracy of workpiece is required. The characterization of surface topography affect greatly on functional performance of workpiece. In recent years, many researchers have made a large progress on the study of surface topography and presented some related standards. The assessment of parameters of surface roughness, however, has not been researched intensively in the new generation of standards system. This paper proposes a novel roughness separation method based on B spline wavelet to analyze engineering surface. This method improves accuracy of roughness signal separation. The experimental results show that B spline wavelet can extracts accurately the roughness component and experiment results by the proposed method fit with the actual value of the standard sample plate.


2009 ◽  
Vol 1231 ◽  
Author(s):  
Ai Serizawa ◽  
Michael K. Miller

AbstractA series of simulated microstructures containing nanometer-scale precipitates was created with an atom probe simulator. These data were then analyzed with the proximity histogram and the maximum separation method to determine the influence of the particular analysis method. For simulated 2-nm-radius spherical precipitates, the optimized voxel size and delocalization were found to be 0.5-0.6 nm and 1.0-1.5 nm, respectively. Under optimum analysis parameters, the voxelization/delocalization process only slightly degrades the interface width determined from the proximity histogram to ˜0.15±0.04 nm.


Sign in / Sign up

Export Citation Format

Share Document