Electron microscopy studies of octa-calcium phosphate thin films obtained by pulsed laser deposition

2004 ◽  
Vol 453-454 ◽  
pp. 157-161 ◽  
Author(s):  
Monica Iliescu ◽  
V. Nelea ◽  
J. Werckmann ◽  
I.N. Mihailescu ◽  
G. Socol ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Calcium Phosphate ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Fabrication of Ni–Al thin films by the pulsed laser deposition technique

1992 ◽  
Vol 7 (10) ◽  
pp. 2639-2642 ◽  
Author(s):  
R.K. Singh ◽  
Deepika Bhattacharya ◽  
S. Sharan ◽  
P. Tiwari ◽  
J. Narayan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Rutherford Backscattering Spectrometry ◽  
Pulsed Laser ◽  
High Energy ◽  
Laser Deposition ◽  
Nanosecond Laser ◽  
X Ray ◽  
Target Composition

We have fabricated Ni3Al and NiAl thin films on different substrates by the pulsed laser deposition (PLD) technique. A high energy nanosecond laser beam was directed onto Ni–Al (NiAl, Ni3Al) targets, and the evaporated material was deposited onto substrates placed parallel to the target. The substrate temperature was varied between 300 and 400 °C, and the substrate-target distance was maintained at approximately 5 cm. The films were analyzed using scanning electron microscopy, transmission electron microscopy, x-ray diffraction, and Rutherford backscattering spectrometry. At energy densities slightly above the evaporation threshold, a slight enrichment of Al was observed, while at higher energy densities the film stoichiometry was close (<5%) to the target composition. Barring a few particles, the surface of the films exhibited a smooth morphology. X-ray and TEM results corroborated the formation of Ni3Al and NiAl films from similar target compositions. These films were characterized by small randomly oriented grains with grain size varying between 200 and 400 Å.

Pulsed Laser Deposition of Bi4Ti3O12 Thin Films on Indium Tin Oxide Coated Glass

1994 ◽  
Vol 343 ◽  
Author(s):  
H-J. Cho ◽  
William Jo ◽  
T. W. Noh
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Leakage Current ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chemical Compositions ◽  
Coated Glass

ABSTRACTBi4Ti3O12 thin films have been grown on indium tin oxide coated glass by pulsed laser deposition. The films are rapidly thermal annealed at 650 °C in various kinds of ambients. X-ray diffraction and scanning electron microscopy are used to investigate crystallization and microstructures, respectively. Using Auger electron microscopy, chemical compositions and depth profiles are examined. Optical and current-voltage characteristics measurements of the films show that their transmittance and leakage current behaviors are strongly dependent upon the microstructures. O2 partial pressure in the rapid thermal annealing process is found to be an important parameter which determines crystallization, microstructures, and leakage current behaviors of the Bi4Ti3O12 thin films.

Pulsed laser deposition and characterization of conductive RuO2 thin films

1997 ◽  
Vol 12 (6) ◽  
pp. 1433-1436 ◽  
Author(s):  
A. Iembo ◽  
F. Fuso ◽  
E. Arimondo ◽  
C. Ciofi ◽  
G. Pennelli ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Photoelectron Spectroscopy ◽  
Pulsed Laser ◽  
Surface Characteristics ◽  
Laser Deposition ◽  
X Ray ◽  
Substrate Interface

RuO2 thin films have been produced on silicon-based substrates by in situ pulsed laser deposition for the first time. The electrical properties, the surface characteristics, the crystalline structure, and the film-substrate interface of deposited samples have been investigated by 4-probe resistance versus temperature technique, scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction, and transmission electron microscopy, respectively. The films show good electrical properties. The RuO2-substrate interface is very thin (≈3 nm), since it is not degraded by any annealing process. These two characteristics render our films suitable to be used as electrodes in PZT-based capacitors.

Nanocrystalline Er:YAG thin films prepared by pulsed laser deposition: An electron microscopy study

2007 ◽  
Vol 253 (19) ◽  
pp. 8268-8272 ◽  
Author(s):  
Daniela Stanoi ◽  
Andrei Popescu ◽  
Corneliu Ghica ◽  
Gabriel Socol ◽  
Emanuel Axente ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Laser Deposition

Analytical Electron Microscopy of InN thin films Prepared by Pulsed Laser Deposition

2008 ◽  
Vol 14 (S2) ◽  
pp. 254-255 ◽  
Author(s):  
G Drazic ◽  
E Sarantopoulou ◽  
Z Kollia ◽  
A-C Cefalas ◽  
S Kobe
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
New Mexico ◽  
Pulsed Laser Deposition ◽  
Analytical Electron Microscopy ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Analytical Electron

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Growth of calcium phosphate thin films by in situ assisted ultraviolet pulsed laser deposition

2003 ◽  
Vol 208-209 ◽  
pp. 638-644 ◽  
Author(s):  
V. Nelea ◽  
V. Craciun ◽  
M. Iliescu ◽  
I.N. Mihailescu ◽  
H. Pelletier ◽  
...  
Keyword(s):  
Thin Films ◽  
Calcium Phosphate ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

scholarly journals Femtosecond Pulsed Laser Deposition of Chromium Diboride-Rich Thin Films

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 777 ◽  
Author(s):  
Angela De Bonis ◽  
Agostino Galasso ◽  
Alessandro Latini ◽  
Julietta V. Rau ◽  
Antonio Santagata ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Photoelectron Spectroscopy ◽  
Protective Coatings ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chromium Diboride ◽  
X Ray ◽  
Structural Applications

Chromium borides are promising candidates for several structural applications including protective coatings for materials exposed to corrosive and abrasive environments. In this paper the pulsed laser deposition of chromium diboride-rich thin films has been carried out in vacuum by using a frequency doubled Nd:glass laser with a pulse duration of 250 fs. The films have been deposited at different substrate temperatures and characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy. Lastly, the film’s hardness has been studied by Vickers indentation technique. The results indicate that only the films deposited at a substrate temperature of 500 °C are crystalline and formed by chromium diboride, together with a certain amount of boron and chromium, which suggests that, as main mechanism, a process taking place on the surface from atoms and ions from the gas phase. This hypothesis has been confirmed by the study of the plasma produced by the ablation process.

A Simple and Effective Route to Annihilate Defects in Nanocrystalline SnO2 Thin Films Prepared by Pulsed Laser Deposition

2007 ◽  
Vol 1026 ◽  
Author(s):  
Zhiwen Chen ◽  
C. M. L. Wu ◽  
C. H. Shek ◽  
J. K. L. Lai ◽  
Z. Jiao ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Pulsed Laser Deposition ◽  
Gas Sensors ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Transmission Electron ◽  
Sno2 Thin Films

AbstractThe microstructural defects of nanocrystalline SnO2 thin films prepared by pulsed laser deposition have been investigated using transmission electron microscopy, high-resolution transmission electron microscopy and Raman spectroscopy. Defects inside nanocrystalline SnO2 thin films could be significantly reduced by annealing the SnO2 thin films at 300 °C for 2 h. High-resolution transmission electron microscopy showed that stacking faults and twins were annihilated upon annealing. In particular, the edges of the SnO2 nanoparticles demonstrated perfect lattices free of defects after annealing. Raman spectra also confirmed that annealing the specimen was almost defect-free. By using thermal annealing, defect-free nanocrystalline SnO2 thin films can be prepared in a simple and practical way, which holds promise for applications as transparent electrodes and solid-state gas sensors.

Structural Properties of Yttria-stabilized Zirconia Thin Films Grown by Pulsed Laser Deposition

1999 ◽  
Vol 14 (4) ◽  
pp. 1329-1336 ◽  
Author(s):  
J. Y. Dai ◽  
H. C. Ong ◽  
R. P. H. Chang
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Growth Direction ◽  
Yttria Stabilized Zirconia ◽  
Laser Deposition ◽  
Low Oxygen ◽  
Stabilized Zirconia

Yttria-stabilized zirconia (YSZ) thin films grown by the pulsed laser deposition method on (0001) sapphire substrates have been studied by x-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), and scanning electron microscopy (SEM). It was found that the crystal orientation of the YSZ films changes as a function of oxygen pressure during deposition. At low oxygen pressure (50 mTorr), well-defined (111) oriented YSZ films are grown. High oxygen pressure favors the nucleation of (001) oriented YSZ grains. A model to explain the preferred growth direction of (001) YSZ is presented. Utilizing the experimental data, we have developed a two-step process to epitaxially grow high-quality (001) oriented YSZ on (0001) sapphire substrate.

Synthesis and Characterization of Metal-Ceramic Thin Film Nanocomposites With Improved Mechanical Properties

2002 ◽  
Author(s):  
D. Kumar ◽  
N. Sudhir ◽  
S. Yarmolenko ◽  
Q. Wei ◽  
J. Sankar ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Transmission Electron ◽  
Thin Film Composites ◽  
Film Composites

Thin films composite materials consisting of metallic nanocrystals embedded in an insulator host have been synthesized using alternating-target pulsed laser deposition of Fe/Ni and Al2O3. The evaluation of structural quality of the thin film composites using high resolution transmission electron microscopy and scanning transmission electron microscopy with atomic number contrast has revealed the formation of a biphase system with thermodynamically driven segregation of Ni and alumina during pulsed laser deposition. The best hardness values of the thin film composites, measured using nanoindentation techniques, was found to 20–30% larger than pure alumina films fabricated under identical conditions. The improvement in values of hardness of Al2O3 thin films by embedding metal nanocrystals is related to the evolution of a microstructure which efficiently hinders the manipulation and movement of dislocation and the growth of microcracks, which in turn, is achieved by grain boundary hardening.

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