Study of metastabilities in microcrystalline silicon films by photoconductivity techniques

2006 ◽  
Vol 501 (1-2) ◽  
pp. 129-132 ◽  
Author(s):  
N. Souffi ◽  
G.H. Bauer ◽  
R. Brüggemann
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Preparation and properties of microcrystalline silicon films using photochemical vapor deposition

1983 ◽  
Vol 59-60 ◽  
pp. 715-718 ◽  
Author(s):  
Tadashi Saitoh ◽  
Toshikazu Shimada ◽  
Masataka Migitaka ◽  
Yasuo Tarui
Keyword(s):  
Vapor Deposition ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Photochemical Vapor Deposition

Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films

2012 ◽  
Vol 30 (6) ◽  
pp. 061512 ◽  
Author(s):  
A. C. Bronneberg ◽  
N. Cankoy ◽  
M. C. M. van de Sanden ◽  
M. Creatore
Keyword(s):  
Grain Boundaries ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Tissue Quality

STM on doped and undoped hydrogenated amorphous and microcrystalline silicon films

1992 ◽  
Vol 42-44 ◽  
pp. 1398-1402 ◽  
Author(s):  
W. Zimmermann-Edling ◽  
R. Wiesendanger ◽  
F. Finger ◽  
K. Prasad ◽  
A. Shah
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogenated Amorphous

Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films

2011 ◽  
Vol 11 (5) ◽  
pp. S54-S57 ◽  
Author(s):  
Youn J. Kim ◽  
Yoon S. Choi ◽  
In S. Choi ◽  
Jeon G. Han
Keyword(s):  
Plasma Source ◽  
Fast Growth ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Large Area
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