Piezoresistive properties of nanocrystalline silicon thin films deposited on plastic substrates by hot-wire chemical vapor deposition

2007 ◽  
Vol 515 (19) ◽  
pp. 7658-7661 ◽  
Author(s):  
P. Alpuim ◽  
M. Andrade ◽  
V. Sencadas ◽  
M. Ribeiro ◽  
S.A. Filonovich ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Hot Wire ◽  
Plastic Substrates ◽  
Silicon Thin Films

Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

2008 ◽  
Vol 255 (5) ◽  
pp. 2910-2915 ◽  
Author(s):  
P.Q. Luo ◽  
Z.B. Zhou ◽  
K.Y. Chan ◽  
D.Y. Tang ◽  
R.Q. Cui ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Hot Wire ◽  
Silicon Thin Films ◽  
P Type ◽  
Doping Ratio

Role of argon in hot wire chemical vapor deposition of hydrogenated nanocrystalline silicon thin films

2011 ◽  
Vol 519 (11) ◽  
pp. 3501-3508 ◽  
Author(s):  
N.A. Bakr ◽  
A.M. Funde ◽  
V.S. Waman ◽  
M.M. Kamble ◽  
R.R. Hawaldar ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Hot Wire ◽  
Silicon Thin Films

scholarly journals INVESTIGATION OF GROWTH MECHANISM OF NANOCRYSTALLINE SILICON THIN FILMS PREPARED BY HOT-FILAMENT CHEMICAL VAPOR DEPOSITION

1997 ◽  
Vol 46 (10) ◽  
pp. 2015
Author(s):  
CHEN GUO ◽  
GUO XIAO-XU ◽  
ZHU MEI-FANG ◽  
SUN JING-LAN ◽  
XU HUAI-ZHE ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Growth Mechanism ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Silicon Thin Films ◽  
Hot Filament

Growth of “New Form” of Polycrystalline Silicon Thin Films Synthesized by Hot Wire Chemical Vapor Deposition

2005 ◽  
Vol 862 ◽  
Author(s):  
A. R. Middya ◽  
J-J. Liang ◽  
K. Ghosh
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Crystallographic Structure ◽  
Hot Wire ◽  
Silicon Thin Films ◽  
Vapor Deposition Technique ◽  
New Form

AbstractIn this work, we report on next-generation hot wire chemical vapor deposition technique, we call it ceramics hot-wire CVD. Using a new concept of rectangular ceramics filament holder and “confinement of thermal radiation from the filament”, a “new form” of polycrystalline silicon thin films has been developed at low temperature (˜ 250°C). The grains are found to be symmetrically distributed in array along the parallel lines, in (111) direction. On the surface of individual grains, “five-fold” and “six-fold” symmetries have been observed and we suspect that we developed “buckyball” type “giant silicon molecular solids” with different crystalline silicon lattice other than standard single-crystal silicon structure. We observed rarely found “icosaderal” symmetry in silicon thin films. This hypothesis has been supported by multiple Raman active transverse optical modes and the crystallographic structure analyzed by X-ray diffraction.

Nucleation and Growth of Quasicrystalline Silicon Thin Films on Glass Substrate Synthesized by Ceramics Hot Wire Chemical Vapor Deposition

2006 ◽  
Vol 910 ◽  
Author(s):  
Abdul Rafik Middya ◽  
Jian-Jun Liang ◽  
Kartik Ghosh
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Glass Substrate ◽  
Chemical Vapor ◽  
Nucleation And Growth ◽  
Hot Wire ◽  
Silicon Thin Films ◽  
Novel Structure ◽  
Hot Filament

AbstractIn this work, we report on nucleation and growth of silicon thin films on glass substrate with “five-fold” symmetry and “six-fold” symmetry by ceramics hot wire chemical vapor deposition. We observed “confinement of heat and photon” is a powerful approach in developing silicon thin films with novel structure, i.e. quasicrystalline silicon thin films on glass substrate. We found unambiguously that photons emitted from the hot filament influence the nucleation of nanocrystal silicon that produces new type of silicon thin films with “five-fold” symmetry and “six-fold” symmetry.

Effect of HCl addition on the crystalline fraction in silicon thin films prepared by hot-wire chemical vapor deposition

Vacuum ◽  
2009 ◽  
Vol 83 (12) ◽  
pp. 1431-1434 ◽  
Author(s):  
Yung-Bin Chung ◽  
Dong-Kwon Lee ◽  
Chan-Soo Kim ◽  
Nong-Moon Hwang
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Crystalline Fraction ◽  
Silicon Thin Films

Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

2000 ◽  
Vol 360 (1-2) ◽  
pp. 205-212 ◽  
Author(s):  
M. Zhu ◽  
X. Guo ◽  
G. Chen ◽  
H. Han ◽  
M. He ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films
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