Epitaxial growth and surface morphology of aluminum films deposited on mica studied by transmission electron microscopy and atomic force microscopy

2007 ◽  
Vol 516 (1) ◽  
pp. 17-24 ◽  
Author(s):  
Morihide Higo ◽  
Katsuya Fujita ◽  
Masaru Mitsushio ◽  
Toshifumi Yoshidome ◽  
Terumi Kakoi
1995 ◽  
Vol 378 ◽  
Author(s):  
G. Kissinger ◽  
T. Morgenstern ◽  
G. Morgenstern ◽  
H. B. Erzgräber ◽  
H. Richter

AbstractStepwise equilibrated graded GexSii-x (x≤0.2) buffers with threading dislocation densities between 102 and 103 cm−2 on the whole area of 4 inch silicon wafers were grown and studied by transmission electron microscopy, defect etching, atomic force microscopy and photoluminescence spectroscopy.


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