Deposition of Al-doped ZnO thin-films with radio frequency magnetron sputtering for a source/drain electrode for pentacene thin-film transistor

Thin Solid Films ◽

10.1016/j.tsf.2009.01.146 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4644-4649 ◽

Author(s):

Dong-Jin Yun ◽

Shi-Woo Rhee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Thin Film Transistor ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Drain Electrode ◽

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Deposition of NiO[sub x] thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2981075 ◽

2008 ◽

Vol 26 (5) ◽

pp. 1787 ◽

Author(s):

Dong-Jin Yun ◽

Shi-Woo Rhee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Thin Film Transistor ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Drain Electrode

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Structures and properties of the Al-doped ZnO thin films prepared by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.03.026 ◽

2011 ◽

Vol 519 (16) ◽

pp. 5577-5581 ◽

Author(s):

Hongyun Yue ◽

Aimin Wu ◽

Yudong Feng ◽

Xueyu Zhang ◽

Tingju Li

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Structures And Properties ◽

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Physical properties of Cu and Dy co-doped ZnO thin films prepared by radio frequency magnetron sputtering for hybrid organic/inorganic electronic devices

Thin Solid Films ◽

10.1016/j.tsf.2019.06.027 ◽

2019 ◽

Vol 685 ◽

pp. 379-384 ◽

Author(s):

C. Locovei ◽

D. Coman ◽

A. Radu ◽

L. Ion ◽

V.A. Antohe ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Physical Properties ◽

Electronic Devices ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Doped Zno ◽

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Characteristics and Time-Dependent Instability of Ga-Doped ZnO Thin Film Transistor Fabricated by Radio Frequency Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/28/12/128502 ◽

2011 ◽

Vol 28 (12) ◽

pp. 128502 ◽

Author(s):

Hai-Qin Huang ◽

Jian Sun ◽

Feng-Juan Liu ◽

Jian-Wei Zhao ◽

Zuo-Fu Hu ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Thin Film Transistor ◽

Radio Frequency Magnetron ◽

Time Dependent ◽

Zno Thin Film ◽

Radio Frequency Magnetron Sputtering ◽

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Highly transparent and conductive group IV impurity‐doped ZnO thin films prepared by radio frequency magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578678 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2975-2979 ◽

Author(s):

Hirotoshi Sato ◽

Tadatsugu Minami ◽

Shinzo Takata

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Group Iv ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Impurity Doped ◽

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Effect of Ru addition on the properties of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering on polyethylene terephthalate substrate

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2007.10.034 ◽

2008 ◽

Vol 464 (1-2) ◽

pp. 89-94 ◽

Author(s):

Chi Shiung Hsi ◽

Boen Houng ◽

Bing Yi Hou ◽

Guo Ju Chen ◽

Shen Li Fu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Polyethylene Terephthalate ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Doped Zno ◽

Polyethylene Terephthalate Substrate

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Conductive and transparent V-doped ZnO thin films grown by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2014.01.027 ◽

2014 ◽

Vol 557 ◽

pp. 197-202 ◽

Author(s):

Shuhei Okuda ◽

Takuya Matsuo ◽

Hiroshi Chiba ◽

Tatsuya Mori ◽

Katsuyoshi Washio

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

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Variations of microstructure, conductivity and transparency of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering with target–substrate distances

Vacuum ◽

10.1016/j.vacuum.2008.02.008 ◽

2008 ◽

Vol 82 (11) ◽

pp. 1216-1219 ◽

Author(s):

Luo Chen ◽

Xiaofang Bi

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

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Suppression of damage to organic light-emitting layers during deposition of Al-doped ZnO thin films by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.12.097 ◽

2011 ◽

Vol 519 (10) ◽

pp. 3352-3357 ◽

Author(s):

Minoru Yamada ◽

Michio Matsumura ◽

Yasuhiro Maeda

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

Light Emitting ◽

Organic Light ◽

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Deposition of Al doped ZnO thin films on the different substrates with radio frequency magnetron sputtering

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2012.09.024 ◽

2013 ◽

Vol 359 ◽

pp. 69-72 ◽

Author(s):

Saliha Elmas ◽

Şadan Korkmaz

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zno Thin Films ◽

Radio Frequency Magnetron Sputtering ◽

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