Effect of high temperature post-annealing of La0.7Sr0.3MnO3 films deposited by radio frequency magnetron sputtering on SiO2/Si substrates heated at low temperature

2010 ◽  
Vol 518 (15) ◽  
pp. 4432-4436 ◽  
Author(s):  
Sun Gyu Choi ◽  
A. Sivasankar Reddy ◽  
Byoung-Gon Yu ◽  
Woo Seok Yang ◽  
Sang Hoon Cheon ◽  
...  
Keyword(s):  
High Temperature ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Si Substrates ◽  
Post Annealing

Physical Properties of p-Type Tin Monoxide Films Deposited at Low Temperature by Radio Frequency Magnetron Sputtering

2011 ◽  
Vol 4 (7) ◽  
pp. 071101 ◽  
Author(s):  
Toshihiko Toyama ◽  
Yuichi Seo ◽  
Takafumi Konishi ◽  
Hiroaki Okamoto ◽  
Yasuo Tsutsumi
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Physical Properties ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
P Type ◽  
Tin Monoxide
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