Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O3 films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target

2002 ◽  
Vol 95 (1) ◽  
pp. 36-42 ◽  
Author(s):  
Reji Thomas ◽  
Shoichi Mochizuki ◽  
Toshiyuki Mihara ◽  
Tadashi Ishida
Solar Energy ◽  
2019 ◽  
Vol 194 ◽  
pp. 471-477 ◽  
Author(s):  
Yanfeng Wang ◽  
Jianmin Song ◽  
Jie Zhang ◽  
Guoxi Zheng ◽  
Xiaochen Duan ◽  
...  

2007 ◽  
Vol 336-338 ◽  
pp. 374-376
Author(s):  
Jia Xuan Liao ◽  
C.R. Yang ◽  
J.H. Zhang ◽  
H. Chen ◽  
C.L. Fu ◽  
...  

Ba0.6Sr0.4TiO3 (BST) thin films deposited on Pt/Ti/SiO2/Si substrates by radio frequency magnetron sputtering and crystallized by rapid thermal annealing (RTA) exhibit much thinner BST/Pt interfacial transition layer and higher dielectric properties than the films crystallized by conventional thermal annealing (CTA). HRTEM observations show that the transition layer is 2-3nm thick for RTA and 4-5nm thick for CTA. XPS investigations display that the transition layer is composed of perovskited BST phase and non-perovskited BST phase, and RTA corresponds to much less non-perovskited BST phase than CTA. The reason for non-perovskited BST phase and the dielectric properties of BST films are also presented.


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