Raman spectroscopy and mechanical properties of multilayer tetrahedral amorphous carbon films

2011 ◽  
Vol 519 (15) ◽  
pp. 4906-4909 ◽  
Author(s):  
Sai Wang ◽  
Jiaqi Zhu ◽  
Jiazhi Wang ◽  
Xunbo Yin ◽  
Xiao Han
Keyword(s):  
Mechanical Properties ◽  
Raman Spectroscopy ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Tetrahedral Amorphous Carbon

Plasma deposition of amorphous carbon films from methane atmospheres highly diluted in argon

2001 ◽  
Vol 697 ◽  
Author(s):  
L. G. Jacobsohn ◽  
F. L. Freire
Keyword(s):  
Mechanical Properties ◽  
Raman Spectroscopy ◽  
Amorphous Carbon ◽  
Plasma Deposition ◽  
Carbon Films ◽  
X Ray Diffraction ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
Partial Pressures ◽  
Amorphous Character

AbstractWe investigated the deposition, structure and mechanical properties of a-C:H films grown in Ar-CH4 mixtures with the Ar partial pressure ranging from 0 to 99 %. The deposition rate strongly decreased with progressive Ar dilution of the CH4 atmosphere. Films deposited in pure CH4 atmospheres have a hydrogen content of 20 at.% that showed a trend to decrease for lower CH4 partial pressures, while the density remained nearly constant at around 1.4x1023 at./cm3. Raman spectroscopy and x-ray diffraction revealed the amorphous character of the films. The compressive internal stress remained constant around 2.5 GPa and the hardness decreases for Ar rich precursor atmospheres.

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