Plasma deposition of amorphous carbon films from methane atmospheres highly diluted in argon
Keyword(s):
X Ray
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AbstractWe investigated the deposition, structure and mechanical properties of a-C:H films grown in Ar-CH4 mixtures with the Ar partial pressure ranging from 0 to 99 %. The deposition rate strongly decreased with progressive Ar dilution of the CH4 atmosphere. Films deposited in pure CH4 atmospheres have a hydrogen content of 20 at.% that showed a trend to decrease for lower CH4 partial pressures, while the density remained nearly constant at around 1.4x1023 at./cm3. Raman spectroscopy and x-ray diffraction revealed the amorphous character of the films. The compressive internal stress remained constant around 2.5 GPa and the hardness decreases for Ar rich precursor atmospheres.
Investigation of tetrahedral amorphous carbon films using x-ray photoelectron and Raman spectroscopy
1999 ◽
Vol 28
(1)
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pp. 231-234
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Keyword(s):
X Ray
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Keyword(s):
2000 ◽
Vol 266-269
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pp. 755-759
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1999 ◽
Vol 111
(6)
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pp. 293-298
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2006 ◽
Vol 45
(3-4)
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pp. 190-195
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2000 ◽
Vol 9
(3-6)
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pp. 752-755
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