Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma

2017 ◽  
Vol 624 ◽  
pp. 49-53 ◽  
Author(s):  
Yuki Ishii ◽  
Tetsuya Kaneko ◽  
Kunio Okimura ◽  
Haruo Shindo ◽  
Masao Isomura
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Radio Frequency ◽  
Amorphous Silicon ◽  
Inductively Coupled Plasma ◽  
Amorphous Silicon Nitride ◽  
Inductively Coupled ◽  
Radio Frequency Sputtering

Diffusion in Isotope Heterostructures Investigated by Neutron Reflectometry

2009 ◽  
Vol 289-292 ◽  
pp. 697-703 ◽  
Author(s):  
Erwin Hüger ◽  
Jochen Stahn ◽  
Udo Geckle ◽  
Michael Bruns ◽  
Harald Schmidt
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Model System ◽  
Neutron Reflectometry ◽  
Diffusion In Solids ◽  
Amorphous Silicon Nitride ◽  
Self Diffusion

Studies of self-diffusion in solids are presented, which are based on neutron reflectometry. For the application of this technique the samples under investigation are prepared in form of isotope heterostructures. These are nanometer sized thin films, which are chemically completely homogenous, but isotope modulated. Using this method, diffusion lengths in the order of 1 nm and below can be detected which allows to determine ultra low diffusivities in the order of 10-25 m2/s. For the model system amorphous silicon nitride we demonstrate how the structure of the isotope hetrostructures (triple layers or multilayers) influences the efficiency of diffusivity determination.

Photoluminescence analyses of hydrogenated amorphous silicon nitride thin films

2011 ◽  
Vol 131 (7) ◽  
pp. 1305-1311 ◽  
Author(s):  
Mustafa Anutgan ◽  
Tamila (Aliyeva) Anutgan ◽  
Ismail Atilgan ◽  
Bayram Katircioglu
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Amorphous Silicon Nitride ◽  
Hydrogenated Amorphous

Amorphous silicon nitride thin films deposited using d. c. discharge and post-discharge devices

1990 ◽  
Vol 189 (1) ◽  
pp. 111-123 ◽  
Author(s):  
J.L. Jauberteau ◽  
D. Conte ◽  
M.I. Baraton ◽  
P. Quintard ◽  
J. Aubreton ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Post Discharge ◽  
Amorphous Silicon Nitride

Dependence of the photoemission of amorphous silicon nitride thin films on their composition

2002 ◽  
Vol 151-152 ◽  
pp. 268-271 ◽  
Author(s):  
G. Compagnini ◽  
C. Galati ◽  
C. Miliani ◽  
R.S. Cataliotti
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Amorphous Silicon Nitride
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