Amorphous silicon nitride thin films deposited using d. c. discharge and post-discharge devices
Keyword(s):
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2009 ◽
Vol 289-292
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pp. 697-703
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2011 ◽
Vol 131
(7)
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pp. 1305-1311
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2005 ◽
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2002 ◽
Vol 151-152
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pp. 268-271
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