Effects of helium concentration on microcrystalline silicon thin film solar cells deposited by atmospheric-pressure plasma deposition at 13.3 kPa

2018 ◽  
Vol 650 ◽  
pp. 32-36 ◽  
Author(s):  
Jung-Dae Kwon ◽  
Johwa Yang ◽  
Jin-Seong Park ◽  
Dong-Won Kang
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Thin Film Solar Cells ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Helium Concentration ◽  
Pressure Plasma

Improved GZO Thin Film Properties with SiOx Buffer Layer by Atmospheric Pressure Plasma Deposition

2014 ◽  
Vol 625 ◽  
pp. 196-200
Author(s):  
Kuo Hui Yang ◽  
Po Ching Ho ◽  
Je Wei Lin ◽  
Ta Hsin Chou ◽  
Kow Ming Chang
Keyword(s):  
Thin Film ◽  
Buffer Layer ◽  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Deposition Process ◽  
Good Alternative ◽  
Pressure Plasma ◽  
Electro Optic ◽  
Single Jet

The Ga-doped zinc-oxides (GZO) as the transparency conductive oxide is the good candidate for substituting ITO. The buffer layer SiOx could improve the quality of GZO thin film. The atmospheric pressure plasma multi-jets (APPMJ) system with three jets was designed and applied for SiOx deposition process. The deposition thickness of three jets was 2.5 times higher than that of single jet, and the uniformity was less than 5% for the area 100mm2. GZO thin film with SiOx buffer layer had 3% decreases in resistivity compared to GZO thin film due to the increasing of mobility. The SiOx/glass fabricated APPMJ system will be a good alternative substrate to bare glass for producing high quality GZO film for advanced electro-optic applications.

scholarly journals Light Scattering and Current Enhancement for Microcrystalline Silicon Thin-Film Solar Cells on Aluminium-Induced Texture Glass Superstrates with Double Texture

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Yunfeng Yin ◽  
Nasim Sahraei ◽  
Selvaraj Venkataraj ◽  
Sonya Calnan ◽  
Sven Ring ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Optical Scattering ◽  
Thin Film Solar Cells ◽  
Surface Topology ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Wide Range

Microcrystalline silicon (μc-Si:H) thin-film solar cells are processed on glass superstrates having both micro- and nanoscale surface textures. The microscale texture is realised at the glass surface, using the aluminium-induced texturing (AIT) method, which is an industrially feasible process enabling a wide range of surface feature sizes (i.e., 700 nm–3 μm) of the textured glass. The nanoscale texture is made by conventional acid etching of the sputter-deposited transparent conductive oxide (TCO). The influence of the resulting “double texture” on the optical scattering is investigated by means of atomic force microscopy (AFM) (studying the surface topology), haze measurements (studying scattering into air), and short-circuit current enhancement measurements (studying scattering into silicon). A predicted enhanced optical scattering efficiency is experimentally proven by a short-circuit current enhancementΔIscof up to 1.6 mA/cm2(7.7% relative increase) compared to solar cells fabricated on a standard superstrate, that is, planar glass covered with nanotextured TCO. Enhancing the autocorrelation length (or feature size) of the AIT superstrates might have the large potential to improve theμc-Si:H thin-film solar cell efficiency, by reducing the shunting probability of the device while maintaining a high optical scattering performance.

A novel way of texturing glass for microcrystalline silicon thin film solar cells application

2014 ◽  
Vol 23 (10) ◽  
pp. 1283-1290 ◽  
Author(s):  
Guangtao Yang ◽  
René A. C. M. M. van Swaaij ◽  
Olindo Isabella ◽  
Miro Zeman
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Thin Film Solar Cells ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film
Sign in / Sign up

Export Citation Format

Share Document