Evaluation of sputtering induced surface roughness development of Ni/Cu multilayers thin films by Time-of-Flight Secondary Ion Mass Spectrometry depth profiling with different energies O2+ ion bombardment

2019 ◽  
Vol 669 ◽  
pp. 188-197
Author(s):  
X.L. Yan ◽  
M.M. Duvenhage ◽  
J.Y. Wang ◽  
H.C. Swart ◽  
J.J. Terblans
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