Evaluation of sputtering induced surface roughness development of Ni/Cu multilayers thin films by Time-of-Flight Secondary Ion Mass Spectrometry depth profiling with different energies O2+ ion bombardment
1999 ◽
Vol 17
(1)
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pp. 224
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2006 ◽
Vol 20
(8)
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pp. 1327-1334
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1994 ◽
Vol 33
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pp. 1023-1043
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2013 ◽
Vol 117
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pp. 21281-21287
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