Experimental evaluation of the role of oxygen on the growth of MgOx nano-sculpted thin films synthesized by reactive magnetron sputtering combined with glancing angle deposition

2021 ◽  
Vol 718 ◽  
pp. 138480
Author(s):  
X. Geng ◽  
H. Liang ◽  
W.J. Li ◽  
A. Panepinto ◽  
D. Thiry ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Experimental Evaluation ◽  
Glancing Angle Deposition ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Glancing Angle ◽  
Angle Deposition

scholarly journals Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering

Coatings ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 768
Author(s):  
Samiran Bairagi ◽  
Kenneth Järrendahl ◽  
Fredrik Eriksson ◽  
Lars Hultman ◽  
Jens Birch ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Growth Mechanism ◽  
Strong Dependence ◽  
Glancing Angle Deposition ◽  
Reactive Magnetron Sputtering ◽  
Average Particle ◽  
Reactive Magnetron ◽  
Working Pressure ◽  
Glancing Angle ◽  
Angle Deposition

Glancing angle deposition (GLAD) of AlN nanostructures was performed at room temperature by reactive magnetron sputtering in a mixed gas atmosphere of Ar and N2. The growth behavior of nanostructures shows strong dependence on the total working pressure and angle of incoming flux. In GLAD configuration, the morphology changed from coalesced, vertical nanocolumns with faceted terminations to highly inclined, fan-like, layered nanostructures (up to 38°); while column lengths decreased from around 1743 to 1068 nm with decreasing pressure from 10 to 1.5 mTorr, respectively. This indicates a change in the dominant growth mechanism from ambient flux dependent deposition to directional ballistic shadowing deposition with decreasing working pressures, which is associated with the change of energy and incident angle of incoming reactive species. These results were corroborated using simulation of metal transport (SiMTra) simulations performed at similar working pressures using Ar and N separately, which showed the average particle energy and average angle of incidence decreased while the total average scattering angle of the metal flux arriving at substrate increased with increasing working pressures. Observing the crystalline orientation of GLAD deposited wurtzite AlN nanocolumns using X-ray diffraction (XRD), pole-figure measurements revealed c-axis <0001> growth towards the direction of incoming flux and a transition from fiber-like to biaxial texture took place with increasing working pressures. Under normal deposition conditions, AlN layer morphology changed from {0001} to {101¯1} with increasing working pressure because of kinetic energy-driven growth.

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

2011 ◽  
Vol 406 (13) ◽  
pp. 2658-2662 ◽  
Author(s):  
Chaoquan Hu ◽  
Liang Qiao ◽  
Hongwei Tian ◽  
Xianyi Lu ◽  
Qing Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Glancing angle deposition of SiO 2 thin films using a novel collimated magnetron sputtering technique

2017 ◽  
Vol 319 ◽  
pp. 61-69 ◽  
Author(s):  
S. Maidul Haque ◽  
K. Divakar Rao ◽  
S. Tripathi ◽  
Rajnarayan De ◽  
D.D. Shinde ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Glancing Angle Deposition ◽  
Glancing Angle ◽  
Angle Deposition
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