Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Vacuum ◽  
2011 ◽  
Vol 85 (10) ◽  
pp. 932-937 ◽  
Author(s):  
Tae-Kyung Ha ◽  
Jong-Chang Woo ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Plasma System ◽  
Inductively Coupled ◽  
Ar Plasma

Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing

Vacuum ◽  
2014 ◽  
Vol 107 ◽  
pp. 20-22 ◽  
Author(s):  
I. Hotovy ◽  
S. Hascik ◽  
M. Gregor ◽  
V. Rehacek ◽  
M. Predanocy ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Gas Sensing ◽  
Dry Etching ◽  
Tio2 Thin Films ◽  
Inductively Coupled

Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma

Vacuum ◽  
2020 ◽  
Vol 181 ◽  
pp. 109421
Author(s):  
Moon Hwan Cha ◽  
Eun Taek Lim ◽  
Sung Yong Park ◽  
Ji Su Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma

2008 ◽  
Vol 14 (3) ◽  
pp. 297-302 ◽  
Author(s):  
Su Ryun Min ◽  
Han Na Cho ◽  
Yue Long Li ◽  
Sung Keun Lim ◽  
Seung Pil Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

scholarly journals Etch Characteristics of TiN Thin Films in the Inductively Coupled Plasma System

2008 ◽  
Vol 41 (3) ◽  
pp. 83-87
Author(s):  
Doo-Seung Um ◽  
Chan-Min Kang ◽  
Xue Yang ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Plasma System ◽  
Inductively Coupled ◽  
Tin Thin Films

Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma

2009 ◽  
Vol 384 (1) ◽  
pp. 17-24
Author(s):  
Doo-Seung Um ◽  
Dong-Pyo Kim ◽  
Jong-Chang Woo ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled
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