Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

2007 ◽  
Vol 515 (12) ◽  
pp. 4955-4959 ◽  
Author(s):  
Gwan-Ha Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Buffer Layer ◽  
Magnesium Oxide ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Oxide Thin Films ◽  
Inductively Coupled ◽  
Mfis Structure

Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing

Vacuum ◽  
2014 ◽  
Vol 107 ◽  
pp. 20-22 ◽  
Author(s):  
I. Hotovy ◽  
S. Hascik ◽  
M. Gregor ◽  
V. Rehacek ◽  
M. Predanocy ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Gas Sensing ◽  
Dry Etching ◽  
Tio2 Thin Films ◽  
Inductively Coupled

High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma

1994 ◽  
Vol 33 (Part 1, No. 7B) ◽  
pp. 4438-4441 ◽  
Author(s):  
Keiji Nakamura ◽  
Tomonori Imura ◽  
Hideo Sugai ◽  
Michiko Ohkubo ◽  
Katsutaro Ichihara
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
High Speed ◽  
Oxide Thin Films ◽  
Inductively Coupled

Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma

2009 ◽  
Vol 384 (1) ◽  
pp. 17-24
Author(s):  
Doo-Seung Um ◽  
Dong-Pyo Kim ◽  
Jong-Chang Woo ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled Plasma Treatment

2014 ◽  
Vol 16 (1) ◽  
pp. 79-82 ◽  
Author(s):  
Zebin Li ◽  
Zhonghang Wu ◽  
Jiaqi Ju ◽  
Kongduo He ◽  
Zhenliu Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Plasma Treatment ◽  
Work Function ◽  
Inductively Coupled Plasma ◽  
Oxide Thin Films ◽  
Inductively Coupled

The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

Vacuum ◽  
2012 ◽  
Vol 86 (12) ◽  
pp. 2152-2157 ◽  
Author(s):  
Jong-Chang Woo ◽  
Yoon-Soo Chun ◽  
Young-Hee Joo ◽  
Chang-II Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Tio2 Thin Films ◽  
Plasma System ◽  
Metal Insulator ◽  
Inductively Coupled ◽  
Metal Insulator Metal
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