Deposition of chromium nitride coatings using vacuum arc plasma in increased negative substrate bias voltage

The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated.

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The effect of substrate bias voltage on the adhesion strength of ta-C coated tools prepare by filtered cathode vacuum arc

International Journal of Surface Science and Engineering ◽

10.1504/ijsurfse.2017.087420 ◽

2017 ◽

Vol 11 (4) ◽

pp. 370

Author(s):

Young Jun Jang ◽

Yong Jin Kang ◽

Jongkuk Kim

Keyword(s):

Adhesion Strength ◽

Bias Voltage ◽

Vacuum Arc ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Coated Tools

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Improvement of Zr film purity by using a purified sputtering target and negative substrate bias voltage

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2006.01.009 ◽

2006 ◽

Vol 201 (3-4) ◽

pp. 1899-1901 ◽

Cited By ~ 15

Author(s):

J.-W. Lim ◽

J.W. Bae ◽

Y.F. Zhu ◽

S. Lee ◽

K. Mimura ◽

...

Keyword(s):

Bias Voltage ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Negative Substrate Bias

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Characterization of Bias Sputtered Aluminum Film

MRS Proceedings ◽

10.1557/proc-76-265 ◽

1986 ◽

Vol 76 ◽

Author(s):

Y. Homma ◽

K. Hinode ◽

T. Terada

Keyword(s):

Heat Treatment ◽

Bias Voltage ◽

Void Growth ◽

Aluminum Film ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Film Characteristics ◽

Negative Substrate Bias

ABSTRACTThe characteristics of RF bias-sputtered Al films are clarified. A negative substrate bias voltage, VDC, produced by RF biasing, strongly influences not only the planarization effect but also film characteristics such as hillock and void growth, and Ar content.Films deposited at VDc lower than -150 V. are significantly degraded due to the formation of two kinds of voids grown during annealing. One type is a blister-like voids, while the others are large and irregular. These are produced when Ar is released from the films during heat treatment. as evidenced by the fact that the amount of Ar released from the films rapidly increases when VDC is lower than -150 V.Although biasing strongly effects Al films resulting in the formation of an almost complete (111) texture. the effect degrades as VDC exceeds -200 V. Thus, Al bias sputtering requires a high resputtering rate and a VDC higher than -150 V to achieve appropriate planarization with suitable film characteristics.

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Deposition of CrN Coatings by Filtered Cathodic Vacuum Arc

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.373-374.130 ◽

2008 ◽

Vol 373-374 ◽

pp. 130-133 ◽

Cited By ~ 2

Author(s):

Ji Liang Mo ◽

Min Hao Zhu ◽

J. An ◽

H. Sun ◽

Yong Xiang Leng ◽

...

Keyword(s):

Partial Pressure ◽

Bias Voltage ◽

Vacuum Arc ◽

Substrate Bias ◽

Nitrogen Partial Pressure ◽

Substrate Bias Voltage ◽

Crn Coating ◽

Deposition Parameters ◽

Filtered Cathodic Vacuum Arc ◽

Crn Coatings

CrN coatings were deposited on cemented carbide substrates by filtered cathodic vacuum arc technique (FCVA). The effect of different deposition parameters: nitrogen partial pressure, substrate-bias voltage and preheating of the substrate, on the structural and mechanical properties of the coating was investigated. X-ray diffraction analysis was used to determine the structure and composition of the coatings. The tribological behaviour and wear properties of the coatings against Si3N4 ball at different normal loads were studied under reciprocating sliding condition. The results showed that a smooth and dense CrN coating with good properties can be obtained provided a pure Cr interlayer was pre-deposited. The optimal deposition parameters were the nitrogen partial pressure of 0.1 Pa, substrate-bias voltage of -100 V. Preheating of the substrate was no good for improving the properties of the coating. The FCVA CrN coating showed high hardness and good wear resistance, which was probably attributed to its smooth surface and dense microstructure. The wear mechanism of the CrN coating was a combination of abrasion and oxidation. However, the coating flaked off at high normal load due to the deficient adhesion strength of the coating to the substrate.

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Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.189-193.668 ◽

2011 ◽

Vol 189-193 ◽

pp. 668-671

Author(s):

Ming Sheng Li ◽

Yong Zhong Fan ◽

Shu Juan Zhang ◽

Chang Jie Feng

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

High Hardness ◽

Substrate Bias ◽

Dense Structure ◽

Substrate Bias Voltage ◽

Structure And Property ◽

Excellent Adhesion ◽

Mechanical Performances ◽

Negative Substrate Bias

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

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