Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

2011 ◽  
Vol 189-193 ◽  
pp. 668-671
Author(s):  
Ming Sheng Li ◽  
Yong Zhong Fan ◽  
Shu Juan Zhang ◽  
Chang Jie Feng
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
High Hardness ◽  
Substrate Bias ◽  
Dense Structure ◽  
Substrate Bias Voltage ◽  
Structure And Property ◽  
Excellent Adhesion ◽  
Mechanical Performances ◽  
Negative Substrate Bias

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

Improvement of Zr film purity by using a purified sputtering target and negative substrate bias voltage

2006 ◽  
Vol 201 (3-4) ◽  
pp. 1899-1901 ◽  
Author(s):  
J.-W. Lim ◽  
J.W. Bae ◽  
Y.F. Zhu ◽  
S. Lee ◽  
K. Mimura ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Negative Substrate Bias

Characterization of Bias Sputtered Aluminum Film

1986 ◽  
Vol 76 ◽  
Author(s):  
Y. Homma ◽  
K. Hinode ◽  
T. Terada
Keyword(s):  
Heat Treatment ◽  
Bias Voltage ◽  
Void Growth ◽  
Aluminum Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Film Characteristics ◽  
Negative Substrate Bias

ABSTRACTThe characteristics of RF bias-sputtered Al films are clarified. A negative substrate bias voltage, VDC, produced by RF biasing, strongly influences not only the planarization effect but also film characteristics such as hillock and void growth, and Ar content.Films deposited at VDc lower than -150 V. are significantly degraded due to the formation of two kinds of voids grown during annealing. One type is a blister-like voids, while the others are large and irregular. These are produced when Ar is released from the films during heat treatment. as evidenced by the fact that the amount of Ar released from the films rapidly increases when VDC is lower than -150 V.Although biasing strongly effects Al films resulting in the formation of an almost complete (111) texture. the effect degrades as VDC exceeds -200 V. Thus, Al bias sputtering requires a high resputtering rate and a VDC higher than -150 V to achieve appropriate planarization with suitable film characteristics.

Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

2007 ◽  
Vol 253 (17) ◽  
pp. 7192-7196 ◽  
Author(s):  
M. Flores ◽  
L. Huerta ◽  
R. Escamilla ◽  
E. Andrade ◽  
S. Muhl
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage

Influential Factors on Microstructure of LaB6 Films

2013 ◽  
Vol 385-386 ◽  
pp. 3-6
Author(s):  
Jing Xu
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Bias Voltage ◽  
Substrate Surface ◽  
Influential Factors ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Sputtering Deposition ◽  
Morphology Of Films

LaB6 films are deposited by magnetron sputtering deposition. ZrO2 glass is used as substrate. Bias voltage and substrate temperature are adjusted. Morphology of films that deposited at different parameters is characterized by AFM. Results of AFM shows that grains diameter on surface of LaB6 films is nanoscale, and roughness of the surface is less than 20nm. LaB6 crystallites are seen to cover substrate surface entirely. Structure of films is smooth and compactness, and there is no obviously default is found. Bias-voltage influences morphologies of films more obviously than substrate. The best bias voltage is-100V. Structure of film that deposited at 450°C is more compactness than others, and roughness of the film is least.

scholarly journals DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE

2019 ◽  
pp. 154-160
Author(s):  
A.S. Kuprin ◽  
S.A. Leonov ◽  
V.D. Ovcharenko ◽  
E.N. Reshetnyak ◽  
V.A. Belous ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Nitrogen Pressure ◽  
Vacuum Arc ◽  
Substrate Bias ◽  
Arc Plasma ◽  
Properties Of Coatings ◽  
Substrate Bias Voltage ◽  
Titanium Nitride Coating ◽  
Phase And Chemical Composition ◽  
Negative Substrate Bias

The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated.

Sign in / Sign up

Export Citation Format

Share Document