Annealing effects on a-SiC:H and a-SiCN:H films deposited by plasma CVD methods

Experimental and theoretical study Porphyrin-grafted ZnO nanowire arrays were investigated for organic/inorganic hybrid solar cell applications. Two types of porphyrin – Tetra (4-carboxyphenyle) TCPP and meso-Tetraphenylporphine (Zinc-TPP)were used to modify the nanowire surfaces. The vertically aligned nanowires with porphyrin modifications were embedded in graphene-enriched poly (3-hexylthiophene) [G-P3HT] for p-n junction nanowire solar cells. Surface grafting of ZnO nanowires was found to improve the solar cell efficiency. There are different effect for the two types of porphyrin as results of Zn existing. Annealing effects on the solar cell performance were investigated by heating the devices up to 225 °C in air. It was found that the cell performance was significantly degraded after annealing. The degradation was attributed to the polymer structural change at high temperature as evidenced by electrochemical impedance spectroscopy measurements.

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Rapid Thermal Annealing Effects on the Electrical and Structural Properties of ITO Thin Films Deposited at Room Temperature

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2013.51.9.691 ◽

2013 ◽

Vol 51 (9) ◽

pp. 691-699

Author(s):

Se-Young Choi ◽

Sung Jin Kim ◽

Kyoon Choi

Keyword(s):

Thin Films ◽

Structural Properties ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Room Temperature ◽

Ito Thin Films ◽

Annealing Effects

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Deposition of Wave-shaped Layered Low-k Dielectric a-C:F Films by C8F18 Plasma CVD

IEEJ Transactions on Fundamentals and Materials ◽

10.1541/ieejfms.130.319 ◽

2010 ◽

Vol 130 (4) ◽

pp. 319-324

Author(s):

Kouichiro Mizuno ◽

Hirotake Sugawara ◽

Akihiro Murayama

Keyword(s):

Plasma Cvd ◽

Low K

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Fabrication of Carbon Nanotube Triode Using Helicon Plasma Cvd with Electroplated Nico Catalyst

MRS Proceedings ◽

10.1557/proc-772-m7.4 ◽

2003 ◽

Vol 772 ◽

Author(s):

Masakazu Muroyama ◽

Kazuto Kimura ◽

Takao Yagi ◽

Ichiro Saito

Keyword(s):

Carbon Nanotubes ◽

Carbon Nanotube ◽

Metal Catalyst ◽

Ni Catalyst ◽

Plasma Cvd ◽

Helicon Plasma ◽

Plasma Enhanced Cvd ◽

Turn On ◽

Aligned Carbon Nanotubes ◽

Vertically Aligned

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.

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