Enhancement of diamond nucleation by applying substrate bias in ECR plasma chemical vapour deposition

Carbon ◽

10.1016/s0008-6223(98)00068-2 ◽

1998 ◽

Vol 36 (5-6) ◽

pp. 569-574 ◽

Author(s):

Hyeongmin Jeon ◽

Chongmu Lee ◽

Akimitsu Hatta ◽

Toshimichi Ito ◽

Takatomo Sasaki ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Diamond Nucleation ◽

Plasma Chemical Vapour Deposition

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Influence of the substrate bias on epitaxial growth of Si films by dc-discharge plasma chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/13/12/016 ◽

1998 ◽

Vol 13 (12) ◽

pp. 1426-1430 ◽

Author(s):

E Mateeva ◽

P Sutter

Keyword(s):

Epitaxial Growth ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Dc Discharge ◽

Plasma Chemical Vapour Deposition ◽

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Microwave plasma chemical vapour deposition diamond nucleation on ferrous substrates with Ti and Cr interlayers

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00029-8 ◽

2002 ◽

Vol 11 (9) ◽

pp. 1617-1622 ◽

Author(s):

F.J.G Silva ◽

A.P.M Baptista ◽

E Pereira ◽

V Teixeira ◽

Q.H Fan ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Diamond Nucleation ◽

Chemical Vapour Deposition Diamond ◽

Plasma Chemical Vapour Deposition

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The Effect of Mesh Bias and Substrate Bias on the Properties of a-Si:H Deposited by Triode Plasma Chemical Vapour Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.5663 ◽

1994 ◽

Vol 33 (Part 1, No. 10) ◽

pp. 5663-5667 ◽

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Gautam Ganguly ◽

Akihisa Matsuda

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Diamond film deposition by downstream d.c. glow discharge plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90218-6 ◽

1994 ◽

Vol 3 (4-6) ◽

pp. 531-533 ◽

Author(s):

V.M. Polushkin ◽

S.N. Polyakov ◽

A.T. Rakhimov ◽

N.V. Suetin ◽

M.A. Timofeyev ◽

...

Keyword(s):

Glow Discharge ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Film Deposition ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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