Epitaxial growth of high-quality InN films on sapphire substrates by plasma-assisted molecular-beam epitaxy

2003 ◽  
Vol 252 (1-3) ◽  
pp. 128-135 ◽  
Author(s):  
Masataka Higashiwaki ◽  
Toshiaki Matsui
CrystEngComm ◽  
2014 ◽  
Vol 16 (33) ◽  
pp. 7626-7632 ◽  
Author(s):  
Wenliang Wang ◽  
Weijia Yang ◽  
Zuolian Liu ◽  
Yunhao Lin ◽  
Shizhong Zhou ◽  
...  

2 inch high-quality Al epitaxial films with sharp and abrupt Al/Al2O3 interfaces have been grown on sapphire substrates by molecular beam epitaxy with an in-plane alignment of Al[11̄0]/Al2O3[11̄00].


2006 ◽  
Vol 89 (12) ◽  
pp. 122912 ◽  
Author(s):  
Xing Gu ◽  
Natalia Izyumskaya ◽  
Vitaly Avrutin ◽  
Hadis Morkoç ◽  
Tae Dong Kang ◽  
...  

1985 ◽  
Vol 58 (2) ◽  
pp. 793-796 ◽  
Author(s):  
Naoki Mino ◽  
Masakazu Kobayashi ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi

2001 ◽  
Vol 693 ◽  
Author(s):  
M. A. Reshchikov ◽  
D. Huang ◽  
F. Yun ◽  
H. Morkoç ◽  
R. J. Molnar ◽  
...  

AbstractWe analyzed the photoluminescence (PL) spectra of undoped GaN films grown by molecular beam epitaxy on sapphire substrates. While the PL spectra from high-quality samples contain free and bound exciton peaks only, the spectra from some samples involve sharp unidentified peaks in the energy range of 3.0 – 3.45 eV, specifically at 3.21, 3.32, 3.36, and 3.42 eV. We attribute these peaks to excitons bound to defects because of the linear and sometimes superlinear increase in their intensity with excitation density without saturation up to 100 W/cm2. With increasing temperature these peaks quench in a well-known fashion similar to that for excitons. In order to relate the observed peaks to the structural defects, we etched selected samples in hot H3PO4 acid or, alternatively, with photo-electrochemical (PEC) etching at room temperature in the presence of UV-illumination in a dilute KOH solution. In the former case the dislocations were etched leaving etched pits on the surface, while in the latter case the dislocations remained unetched due to a deficit of photogenerated holes at dislocation sites. We found that the 3.42 eV peak disappeared after both hot wet and PEC etching suggesting that the associated defect is at the GaN surface. Peaks at 3.21 and 3.36 eV could be enhanced greatly by PEC etching, which were correlated to bulk dislocations.


2012 ◽  
Vol 112 (4) ◽  
pp. 1051-1055 ◽  
Author(s):  
Ping Ding ◽  
Xinhua Pan ◽  
Zhizhen Ye ◽  
Haiping He ◽  
Honghai Zhang ◽  
...  

2013 ◽  
Vol 279 ◽  
pp. 212-215 ◽  
Author(s):  
H.H. Zhang ◽  
X.H. Pan ◽  
P. Ding ◽  
J.Y. Huang ◽  
H.P. He ◽  
...  

2002 ◽  
Vol 41 (Part 1, No. 7A) ◽  
pp. 4454-4457 ◽  
Author(s):  
Kulandaivel Jeganathan ◽  
Xu-Qiang Shen ◽  
Toshihide Ide ◽  
Mitsuaki Shimizu ◽  
Hajime Okumura

2008 ◽  
Vol 57 (2) ◽  
pp. 1236
Author(s):  
He Meng ◽  
Liu Guo-Zhen ◽  
Qiu Jie ◽  
Xing Jie ◽  
Lü Hui-Bin

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