Comparative study of the oxidation of thin porous silicon layers studied by reflectometry, spectroscopic ellipsometry and secondary ion mass spectroscopy

1998 ◽  
Vol 80 (1-4) ◽  
pp. 147-152 ◽  
Author(s):  
M Fried ◽  
O Polgár ◽  
T Lohner ◽  
S Strehlke ◽  
C Levy-Clement
1995 ◽  
Vol 405 ◽  
Author(s):  
T. V. Torchinskaya ◽  
N. E. Korsunskaya ◽  
B. R. Dzumaev ◽  
M. K. Sheinkman

AbstractUsing PL, PLE, secondary ion mass spectroscopy (SIMS) and EPR investigations we show in this paper that two luminescence bands with different PL excitation spectra exist on the surface of silicon wires in PS.


2004 ◽  
Vol 809 ◽  
Author(s):  
Mudith S. A. Karunaratne ◽  
Janet M. Bonar ◽  
Jing Zhang ◽  
Arthur F. W. Willoughby

ABSTRACTIn this paper, we compare B diffusion in epitaxial Si, Si with 0.1%C, SiGe with 11% Ge and SiGe:C with 11%Ge and 0.1%C at 1000°C under interstitial, vacancy and non-injection annealing conditions. Diffusion coefficients of B in each material were extracted by computer simulation, using secondary ion mass spectroscopy (SIMS) profiles obtained from samples before and after annealing.Interstitial injection enhances B diffusion considerably in all materials compared to inert annealing. In samples which experienced vacancy injection, B diffusion was suppressed. The results are consistent with the view that B diffusion in these materials occurs primarily via interstitialcy type defects.


Author(s):  
B. K. Furman ◽  
S. Purushothaman ◽  
E. Castellani ◽  
S. Renick ◽  
D. Neugroshl

2010 ◽  
Vol 82 (17) ◽  
Author(s):  
Nobuaki Takahashi ◽  
Teruyasu Mizoguchi ◽  
Tsubasa Nakagawa ◽  
Tetsuya Tohei ◽  
Isao Sakaguchi ◽  
...  

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