Laser annealing of SrBi2Ta2O9 thin films

2000 ◽  
Vol 375 (1-2) ◽  
pp. 172-175 ◽  
Author(s):  
Zhigang Zhang ◽  
Jinsong Zhu ◽  
Dong Su ◽  
Jianshe Liu ◽  
Huiming Shen ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Annealing

Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films Crystallized by Pulsed Laser Annealing

2021 ◽  
Author(s):  
Natalia Volodina ◽  
Anna Dmitriyeva ◽  
Anastasia Chouprik ◽  
Elena Gatskevich ◽  
Andrei Zenkevich
Keyword(s):  
Thin Films ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing

Preparation of BaTiO3 thin films using pulsed KrF laser deposition and IN SITU laser annealing

1998 ◽  
Vol 20 (1-4) ◽  
pp. 87-94
Author(s):  
Atsushi Ito ◽  
Akihiko Machida ◽  
Minoru Obara
Keyword(s):  
Thin Films ◽  
Laser Annealing ◽  
Laser Deposition ◽  
Krf Laser

Recrystallization of copper thin films following laser annealing

1987 ◽  
Vol 23 (2) ◽  
pp. 233
Author(s):  
A. Venkert ◽  
Y. Zeiri ◽  
J. Bloch
Keyword(s):  
Thin Films ◽  
Laser Annealing

Optical, Structural and Electrical Characteristics of Explosively Crystallized Si Thin Films on Glass Substrates

1981 ◽  
Vol 4 ◽  
Author(s):  
G. Auvert ◽  
D. Bensahel ◽  
A. Perio ◽  
F. Morin ◽  
G.A. Rozgonyi ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Laser Annealing ◽  
The State ◽  
Electrical Characteristics ◽  
Glass Substrates ◽  
Explosive Crystallization ◽  
Cw Laser ◽  
Structural And Electrical Properties ◽  
Si Films

ABSTRACTExplosive Crystallization occurs in cw laser annealing on a-Si films deposited on glass substrates at laser scan speeds higher than 30 cm/sec. Optical, structural and electrical properties of the crystallized films at various laser scan speeds confirm the existence of two kinds of explosive growth depending on the state of crystallinity of the starting material.

Crystal Growth of Silicon Thin Films on Glass by Excimer Laser Annealing: A Molecular-Dynamics Study

2006 ◽  
Vol 45 (5B) ◽  
pp. 4344-4346 ◽  
Author(s):  
Shinji Munetoh ◽  
Takahide Kuranaga ◽  
Byoung Min Lee ◽  
Teruaki Motooka ◽  
Takahiko Endo ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Dynamics ◽  
Crystal Growth ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Excimer Laser Annealing ◽  
Silicon Thin Films

Crystallization of Double-Layered Silicon Thin Films by Solid Green Laser Annealing

2007 ◽  
Vol 46 (No. 8) ◽  
pp. L164-L166 ◽  
Author(s):  
Yuta Sugawara ◽  
Yukiharu Uraoka ◽  
Hiroshi Yano ◽  
Tomoaki Hatayama ◽  
Takashi Fuyuki ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Annealing ◽  
Green Laser ◽  
Silicon Thin Films

Diode laser annealing on sputtered epitaxial Cu2 ZnSnS4 thin films

2017 ◽  
Vol 11 (5) ◽  
pp. 1700033 ◽  
Author(s):  
Ning Song ◽  
Jialiang Huang ◽  
Martin A. Green ◽  
Xiaojing Hao
Keyword(s):  
Thin Films ◽  
Diode Laser ◽  
Laser Annealing

Pulsed Excimer Laser Processing of AlN/GaN Thin Films

1996 ◽  
Vol 449 ◽  
Author(s):  
W. S. Wong ◽  
L. F. Schloss ◽  
G.S. Sudhir ◽  
B. P. Linder ◽  
K-M. Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
Excimer Laser ◽  
Laser Processing ◽  
Laser Annealing ◽  
Rutherford Backscattering Spectrometry ◽  
Pulsed Laser ◽  
Emission Peak ◽  
Dopant Activation ◽  
Pulsed Laser Annealing

ABSTRACTA KrF (248 nm) excimer laser with a 38 ns pulse width was used to study pulsed laser annealing of AIN/GaN bi-layers and dopant activation of Mg-implanted GaN thin films. For the AIN/GaN bi-layers, cathodoluminescence (CL) showed an increase in the intensity of the GaN band-edge peak at 3.47 eV after pulsed laser annealing at an energy density of 2000 mJ/cm2. Rutherford backscattering spectrometry of a Mg-implanted A1N (75 nm thick)/GaN (1.0 μm thick) thin-film heterostructure showed a 20% reduction of the 4He+ backscattering yield after laser annealing at an energy density of 400 mJ/cm2. CL measurements revealed a 410 nm emission peak indicating the incorporation of Mg after laser processing.

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