Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering

Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

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Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

Materials Today Proceedings ◽

10.1016/j.matpr.2018.01.050 ◽

2018 ◽

Vol 5 (1) ◽

pp. 2696-2704 ◽

Cited By ~ 3

Author(s):

M. Muralidhar Singh ◽

G. Vijaya ◽

M.S. Krupashankara ◽

B.K. Sridhara ◽

T.N. Shridhar

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Film Coatings ◽

Thin Film Coatings

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Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

Materials Today Proceedings ◽

10.1016/j.matpr.2017.06.154 ◽

2017 ◽

Vol 4 (5) ◽

pp. 6466-6471 ◽

Cited By ~ 6

Author(s):

Kittikhun Seawsakul ◽

Mati Horprathum ◽

Pitak Eiamchai ◽

Viyapol Pattantsetakul ◽

Saksorn Limwichean ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Zno Thin Film ◽

Dc Magnetron Sputtering ◽

Pulsed Dc ◽

Sputtering Power ◽

Doped Zno ◽

Pulsed Dc Magnetron Sputtering

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Optical Properties of Nanocrystalline/Amorphous TiO2 Thin Film Deposited by rf Plasma Magnetron Sputtering

Acta Physica Polonica A ◽

10.12693/aphyspola.137.1068 ◽

2020 ◽

Vol 137 (6) ◽

pp. 1068-1074

Author(s):

A.A. Abd El-Moula ◽

M. Raaif ◽

F.M. El-Hossary

Keyword(s):

Thin Film ◽

Optical Properties ◽

Magnetron Sputtering ◽

Tio2 Thin Film ◽

Rf Plasma ◽

Amorphous Tio2

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Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.802.47 ◽

2013 ◽

Vol 802 ◽

pp. 47-52

Author(s):

Chuleerat Ibuki ◽

Rachasak Sakdanuphab

Keyword(s):

Thin Film ◽

Thin Films ◽

Grain Size ◽

Magnetron Sputtering ◽

Crystalline Structure ◽

Glass Substrate ◽

Intrinsic Stress ◽

Dc Magnetron Sputtering ◽

Adhesion Properties ◽

Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

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