Super-hydrophilic anatase TiO2 thin film in-situ deposited by DC magnetron sputtering

Flexible electronic devices have attracted considerable attention in recent years, and textile fabrics are usually used as the substrates because of their good moisture absorption performance and high flexibility. However, ordinary textile fabrics are electrically insulating, which limits their strain sensing sensitivity. In this study, cotton fabric endowed with high electrical conductivity was prepared by a two-step process of in situ polymerization and direct current (DC) magnetron sputtering. It was firstly modified with a continuous polypyrrole (PPy) thin film by using the in situ polymerization method and then coated with silver (Ag) thin film by using a DC magnetron sputtering system. The experimental results revealed that the resultant Ag/PPy-coated cotton deposited with a sputtering power of 200 W for 25 min has the highest electrical conductivity and its average sheet resistance is 11.7 Ω/sq. Moreover, the Ag/PPy-coated cotton exhibited the advantages of high hydrophobicity, thermal stability, electromechanical performance and washing fastness. Overall, the effective flexibility and high electrical conductivity of the Ag/PPy-coated cotton have been validated effectively and make it one of the promising candidates for preparing electromagnetic shielding and antistatic and smart wearable textile products, especially flexible electronic devices.

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In situ Polarized Neutron Reflectometry: Epitaxial Thin-Film Growth of Fe on Cu(001) by dc Magnetron Sputtering

Physical Review Applied ◽

10.1103/physrevapplied.7.054004 ◽

2017 ◽

Vol 7 (5) ◽

Cited By ~ 8

Author(s):

Wolfgang Kreuzpaintner ◽

Birgit Wiedemann ◽

Jochen Stahn ◽

Jean-François Moulin ◽

Sina Mayr ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Film Growth ◽

Neutron Reflectometry ◽

Thin Film Growth ◽

Dc Magnetron Sputtering ◽

Epitaxial Thin Film ◽

Epitaxial Thin Film Growth ◽

Polarized Neutron Reflectometry

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A low temperature in-situ crystalline TiNi shape memory thin film deposited by magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2015.08.068 ◽

2015 ◽

Vol 284 ◽

pp. 90-93 ◽

Cited By ~ 2

Author(s):

Hikmet Cicek ◽

Ihsan Efeoglu ◽

Yaşar Totik ◽

Kadri Vefa Ezirmik ◽

Ersin Arslan

Keyword(s):

Thin Film ◽

Low Temperature ◽

Magnetron Sputtering ◽

Shape Memory

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Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

Materials Today Proceedings ◽

10.1016/j.matpr.2018.01.050 ◽

2018 ◽

Vol 5 (1) ◽

pp. 2696-2704 ◽

Cited By ~ 3

Author(s):

M. Muralidhar Singh ◽

G. Vijaya ◽

M.S. Krupashankara ◽

B.K. Sridhara ◽

T.N. Shridhar

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Film Coatings ◽

Thin Film Coatings

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Study on preparing PLT(28) thin film and its electro-optic effect

Journal of Materials Research ◽

10.1557/jmr.1998.0181 ◽

1998 ◽

Vol 13 (5) ◽

pp. 1266-1270 ◽

Cited By ~ 12

Author(s):

Ai-Li Ding ◽

Wei-Gen Luo ◽

P. S. Qiu ◽

J. W. Feng ◽

R. T. Zhang

Keyword(s):

Thin Film ◽

Thin Films ◽

Magnetron Sputtering ◽

Faraday Effect ◽

The Other ◽

Ceramic Powders ◽

Glass Substrates ◽

Annealing Conditions ◽

Electro Optic

PLT(28) thin films deposited on glass substrates were studied by two sputtering processes. One is an in situ magnetron sputtering and the other is a low-temperature magnetron sputtering. The sintered PLT ceramic powders are used as a sputtering target for both processes. The influences of sputtering and annealing conditions on structure and crystallinity of the films were investigated. The electro-optic (E-O) properties of PLT(28) thin films prepared by the two processes were determined by a technique according to Faraday effect. The researches showed the E-O properties were strongly affected by the sputtering process. The film with larger grains exhibits stronger E-O effect. The quadratic E-O coefficient of PLT(28) thin film varies in the range of 0.1 × 10−16 to 1.0 × 10−16 (m/v)2.

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