Properties of hydrogenated amorphous silicon films prepared by low‐frequency (50 Hz) plasma‐enhanced chemical‐vapor deposition

1992 ◽  
Vol 72 (1) ◽  
pp. 234-238 ◽  
Author(s):  
G. Tochitani ◽  
M. Shimozuma ◽  
H. Tagashira
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Hydrogenated Amorphous Silicon ◽  
Low Frequency ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hydrogenated Amorphous

scholarly journals High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells

2016 ◽  
Vol 28 (28) ◽  
pp. 5939-5942 ◽  
Author(s):  
Rongrui He ◽  
Todd D. Day ◽  
Justin R. Sparks ◽  
Nichole F. Sullivan ◽  
John V. Badding
Keyword(s):  
High Pressure ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Pressure Chemical ◽  
Hydrogenated Amorphous

Doped hydrogenated amorphous silicon films by laser‐induced chemical vapor deposition

1986 ◽  
Vol 48 (2) ◽  
pp. 171-173 ◽  
Author(s):  
H. M. Branz ◽  
S. Fan ◽  
J. H. Flint ◽  
B. T. Fiske ◽  
D. Adler ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hydrogenated Amorphous
Sign in / Sign up

Export Citation Format

Share Document