Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

2003 ◽  
Vol 445 (2) ◽  
pp. 207-212 ◽  
Author(s):  
S. Ohno ◽  
D. Sato ◽  
M. Kon ◽  
P.K. Song ◽  
M. Yoshikawa ◽  
...  
Keyword(s):  
Emission Control ◽  
Reactive Sputtering ◽  
Frequency Mode ◽  
Plasma Emission ◽  
Tio2 Films ◽  
Photocatalytic Tio2

High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (1); Unipolar Pulsing with Plasma Emission Control

2008 ◽  
Author(s):  
Yuzo Shigesato ◽  
Kento Hirohata ◽  
Yasutaka Nishi ◽  
Nobuto Oka ◽  
Yasushi Sato ◽  
...  
Keyword(s):  
Emission Control ◽  
Reactive Sputtering ◽  
High Rate ◽  
Plasma Emission ◽  
Doped Zno

Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems

2010 ◽  
Vol 518 (11) ◽  
pp. 2980-2983 ◽  
Author(s):  
Kento Hirohata ◽  
Yasutaka Nishi ◽  
Naoki Tsukamoto ◽  
Nobuto Oka ◽  
Yasushi Sato ◽  
...  
Keyword(s):  
Control Systems ◽  
Emission Control ◽  
Reactive Sputtering ◽  
Plasma Emission ◽  
Doped Zno

scholarly journals Enhancement of optical absorption by modulation of the oxygen flow of TiO2 films deposited by reactive sputtering

2012 ◽  
Vol 111 (11) ◽  
pp. 113513 ◽  
Author(s):  
André L. J. Pereira ◽  
Paulo N. Lisboa Filho ◽  
Javier Acuña ◽  
Iuri S. Brandt ◽  
André A. Pasa ◽  
...  
Keyword(s):  
Optical Absorption ◽  
Reactive Sputtering ◽  
Oxygen Flow ◽  
Tio2 Films

scholarly journals Influence of oxygen flow rate on photocatalytic TiO2 films deposited by rf magnetron sputtering

2011 ◽  
Vol 23 (2) ◽  
pp. 589-594 ◽  
Author(s):  
A. H. Chiou ◽  
C. G. Kuo ◽  
C. H. Huang ◽  
W. F. Wu ◽  
C. P. Chou ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Flow Rate ◽  
Rf Magnetron Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Tio2 Films ◽  
Photocatalytic Tio2

Structural and electrical properties of Nb-doped TiO 2 films sputtered with plasma emission control

2014 ◽  
Vol 568 ◽  
pp. 94-101 ◽  
Author(s):  
S.K. Mukherjee ◽  
H.W. Becker ◽  
A.P. Cadiz Bedini ◽  
A. Nebatti ◽  
C. Notthoff ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Emission Control ◽  
Plasma Emission ◽  
Structural And Electrical Properties

CrN films deposited by rf reactive sputtering using a plasma emission monitoring control

Vacuum ◽  
2002 ◽  
Vol 66 (3-4) ◽  
pp. 227-231 ◽  
Author(s):  
Shozo Inoue ◽  
Futami Okada ◽  
Keiji Koterazawa
Keyword(s):  
Reactive Sputtering ◽  
Plasma Emission ◽  
Emission Monitoring
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