High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (1); Unipolar Pulsing with Plasma Emission Control

2008 ◽  
Author(s):  
Yuzo Shigesato ◽  
Kento Hirohata ◽  
Yasutaka Nishi ◽  
Nobuto Oka ◽  
Yasushi Sato ◽  
...  
Keyword(s):  
Emission Control ◽  
Reactive Sputtering ◽  
High Rate ◽  
Plasma Emission ◽  
Doped Zno

Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems

2010 ◽  
Vol 518 (11) ◽  
pp. 2980-2983 ◽  
Author(s):  
Kento Hirohata ◽  
Yasutaka Nishi ◽  
Naoki Tsukamoto ◽  
Nobuto Oka ◽  
Yasushi Sato ◽  
...  
Keyword(s):  
Control Systems ◽  
Emission Control ◽  
Reactive Sputtering ◽  
Plasma Emission ◽  
Doped Zno

High-rate deposition of Sb-doped SnO2 films by reactive sputtering using the impedance control method

2011 ◽  
Vol 520 (4) ◽  
pp. 1178-1181 ◽  
Author(s):  
Yu Muto ◽  
Nobuto Oka ◽  
Naoki Tsukamoto ◽  
Yoshinori Iwabuchi ◽  
Hidefumi Kotsubo ◽  
...  
Keyword(s):  
Control Method ◽  
Impedance Control ◽  
Reactive Sputtering ◽  
High Rate

High Rate Reactive Sputtering onto Flexible Polymer Sheet

1989 ◽  
pp. 45-54 ◽  
Author(s):  
R. P. Howson ◽  
A. G. Spencer ◽  
K. Oka ◽  
R. W. Lewin
Keyword(s):  
Reactive Sputtering ◽  
High Rate ◽  
Polymer Sheet ◽  
Flexible Polymer

Structural and electrical properties of Nb-doped TiO 2 films sputtered with plasma emission control

2014 ◽  
Vol 568 ◽  
pp. 94-101 ◽  
Author(s):  
S.K. Mukherjee ◽  
H.W. Becker ◽  
A.P. Cadiz Bedini ◽  
A. Nebatti ◽  
C. Notthoff ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Emission Control ◽  
Plasma Emission ◽  
Structural And Electrical Properties

CrN films deposited by rf reactive sputtering using a plasma emission monitoring control

Vacuum ◽  
2002 ◽  
Vol 66 (3-4) ◽  
pp. 227-231 ◽  
Author(s):  
Shozo Inoue ◽  
Futami Okada ◽  
Keiji Koterazawa
Keyword(s):  
Reactive Sputtering ◽  
Plasma Emission ◽  
Emission Monitoring
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