Stoichiometry of tantalum oxide films prepared by KrF excimer laser-induced chemical vapor deposition

1995 ◽  
Vol 261 (1-2) ◽  
pp. 76-82 ◽  
Author(s):  
Yoji Imai ◽  
Akio Watanabe ◽  
Masakazu Mukaida ◽  
Kazuo Osato ◽  
Tatsuo Tsunoda ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Krf Excimer Laser

Application of Penta-Di-Methyl-Amino-Tantalum to a Tantalum Source in Chemical Vapor Deposition of Tantalum Oxide Films

1991 ◽  
Vol 30 (Part 2, No. 11B) ◽  
pp. L1974-L1977 ◽  
Author(s):  
Toshiya Tabuchi ◽  
Yoshinori Sawado ◽  
Kunimasa Uematsu ◽  
Shohei Koshiba
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Chemical Vapor

Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition

1998 ◽  
Vol 73 (16) ◽  
pp. 2299-2301 ◽  
Author(s):  
Jun-Ying Zhang ◽  
Boon Lim ◽  
Ian W. Boyd ◽  
Vincent Dusastre
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
High Quality

NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

1993 ◽  
Vol 32 (Part 2, No. 10A) ◽  
pp. L1448-L1450 ◽  
Author(s):  
Eiji Fujii ◽  
Atsushi Tomozawa ◽  
Satoru Fujii ◽  
Hideo Torii ◽  
Masumi Hattori ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Metalorganic Chemical
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