Excimer Laser Enhancement And Probing Of 111-V Compound Semiconductor Chemical Vapor Deposition

Mapping Intimacies ◽

10.1117/12.942579 ◽

1984 ◽

Author(s):

V. M. Donnelly ◽

R. F. Karlicek

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Compound Semiconductor

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Patterned aluminum growth via excimer laser activated metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.96593 ◽

1986 ◽

Vol 48 (16) ◽

pp. 1051-1053 ◽

Author(s):

G. S. Higashi ◽

C. G. Fleming

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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ArF excimer laser chemical vapor deposition a-Si:H/a-AlxO1−x superlattices

Thin Solid Films ◽

10.1016/0040-6090(92)90904-p ◽

1992 ◽

Vol 218 (1-2) ◽

pp. 62-67

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Excimer Laser Annealing Effects of Silicon-Rich Silicon Nitride Films Prepared by Using Catalytic Chemical Vapor Deposition

ECS Meeting Abstracts ◽

10.1149/ma2009-02/27/2228 ◽

2009 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Excimer Laser ◽

Vapor Deposition ◽

Laser Annealing ◽

Chemical Vapor ◽

Excimer Laser Annealing ◽

Catalytic Chemical Vapor Deposition ◽

Silicon Nitride Films ◽

Annealing Effects

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SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products

Thin Solid Films ◽

10.1016/0040-6090(95)08186-0 ◽

1996 ◽

Vol 274 (1-2) ◽

pp. 70-75 ◽

Author(s):

Akio Watanabe ◽

Kazuo Osato ◽

Shinji Ninomiya ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Decomposition Products ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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Surface analysis study of the oxidation of organotin films deposited by ArF excimer laser chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580916 ◽

1997 ◽

Vol 15 (5) ◽

pp. 2492-2501 ◽

Author(s):

R. Larciprete ◽

E. Borsella ◽

P. De Padova ◽

P. Perfetti ◽

C. Crotti

Keyword(s):

Chemical Vapor Deposition ◽

Surface Analysis ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Analysis Study ◽

Arf Excimer Laser

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ArF excimer laser processing of plasma enhanced chemical vapor deposition silicon oxynitride thin films: Changes in deep ultraviolet transparency and composition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584765 ◽

1989 ◽

Vol 7 (3) ◽

pp. 429 ◽

Author(s):

J. N. Cox

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Laser Processing ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Deep Ultraviolet ◽

Arf Excimer Laser

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Excimer laser-induced chemical vapor deposition of titanium silicide films

10.1364/cleo.1985.fk1 ◽

1985 ◽

Author(s):

G. A. WEST ◽

A. GUPTA ◽

K. W. BEESON

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Titanium Silicide

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Stoichiometry of tantalum oxide films prepared by KrF excimer laser-induced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(95)06510-5 ◽

1995 ◽

Vol 261 (1-2) ◽

pp. 76-82 ◽

Author(s):

Yoji Imai ◽

Akio Watanabe ◽

Masakazu Mukaida ◽

Kazuo Osato ◽

Tatsuo Tsunoda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Tantalum Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

Krf Excimer Laser

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Preparation of Conductingpolymer Thin Films by Excimer Laser Chemical Vapor Deposition

Molecular Crystals and Liquid Crystals Science and Technology Section A Molecular Crystals and Liquid Crystals ◽

10.1080/10587259708032242 ◽

1997 ◽

Vol 294 (1) ◽

pp. 35-38 ◽

Author(s):

Satoru Nishio ◽

Shin-Ichi Okada ◽

Yae Minamimoto ◽

Motoyoshi Okumura ◽

Akiyoshi Matsuzaki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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