Growth of magnesium oxide thin films using single molecular precursors by metal–organic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)01524-7 ◽

1999 ◽

Vol 341 (1-2) ◽

pp. 63-67 ◽

Author(s):

Jin-Hyo Boo ◽

Soon-Bo Lee ◽

Kyu-Sang Yu ◽

Wonyong Koh ◽

Yunsoo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Magnesium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Molecular Precursors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth of atomically flat homoepitaxial magnesium oxide thin films by metal-organic chemical vapor deposition

Materials Chemistry and Physics ◽

10.1016/s0254-0584(00)00502-2 ◽

2001 ◽

Vol 70 (2) ◽

pp. 191-196 ◽

Author(s):

W Fan ◽

P.R Markworth ◽

T.J Marks ◽

R.P.H Chang

Keyword(s):

Chemical Vapor Deposition ◽

Magnesium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Atomically Flat

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Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3294718 ◽

2010 ◽

Vol 28 (2) ◽

pp. 238-243 ◽

Author(s):

Benjamin W. Schmidt ◽

William J. Sweet ◽

Eric J. Bierschenk ◽

Cameron K. Gren ◽

Timothy P. Hanusa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth of TiO2 thin films on Si(100) substrates using single molecular precursors by metal organic chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(00)00765-9 ◽

2000 ◽

Vol 131 (1-3) ◽

pp. 88-92 ◽

Author(s):

Byung-Chang Kang ◽

Soon-Bo Lee ◽

Jin-Hyo Boo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Tio2 Thin Films ◽

Molecular Precursors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Morphology and optical properties of zinc oxide thin films grown on Si (100) by metal-organic chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-008-9664-7 ◽

2008 ◽

Vol 20 (S1) ◽

pp. 441-445 ◽

Author(s):

S. M. Lan ◽

W. Y. Uen ◽

C. E. Chan ◽

K. J. Chang ◽

S. C. Hung ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Zinc oxide thin films nanostructures metal organic chemical vapor deposition

10.32657/10356/3516 ◽

2007 ◽

Author(s):

Swee Tiam Tan

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Structure and Electrical Characteristics of Zinc Oxide Thin Films Grown on Si (111) by Metal-organic Chemical Vapor Deposition

Journal of Material Science and Technology ◽

10.1016/j.jmst.2013.06.011 ◽

2013 ◽

Vol 29 (9) ◽

pp. 830-834 ◽

Author(s):

Yunfeng Wu ◽

Dongping Liu ◽

Naisen Yu ◽

Yuanda Liu ◽

Hongwei Liang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Electrical Characteristics ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Effect of the substrate on the growth of spinel iron oxide thin films by metal-organic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09102-x ◽

1997 ◽

Vol 295 (1-2) ◽

pp. 16-18 ◽

Author(s):

Kiyoshi Kuribayashi ◽

Ryousuke Ueyama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Resistive Oxygen Sensors Using Cerium Oxide Thin Films Prepared by Metal Organic Chemical Vapor Deposition and Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.6920 ◽

2004 ◽

Vol 43 (10) ◽

pp. 6920-6924 ◽

Author(s):

Noriya Izu ◽

Norimitsu Murayama ◽

Woosuck Shin ◽

Ichiro Matsubara ◽

Shuzo Kanzaki

Keyword(s):

Chemical Vapor Deposition ◽

Cerium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxygen Sensors ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Synthesis of aluminum oxide thin films: Use of aluminum tris‐dipivaloylmethanate as a new low pressure metal organic chemical vapor deposition precursor

Applied Physics Letters ◽

10.1063/1.114960 ◽

1995 ◽

Vol 67 (11) ◽

pp. 1624-1626 ◽

Author(s):

E. Ciliberto ◽

I. Fragalà ◽

R. Rizza ◽

G. Spoto ◽

G. C. Allen

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Metal-Organic Chemical Vapor Deposition of Ferroelectric Oxide Thin Films for Electronic and Optical Applications

Annual Review of Materials Science ◽

10.1146/annurev.ms.25.080195.002521 ◽

1995 ◽

Vol 25 (1) ◽

pp. 525-546 ◽

Author(s):

B W Wessels

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Optical Applications ◽

Organic Chemical Vapor Deposition ◽

Ferroelectric Oxide

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