Synthesis of aluminum oxide thin films: Use of aluminum tris‐dipivaloylmethanate as a new low pressure metal organic chemical vapor deposition precursor
2010 ◽
Vol 28
(2)
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pp. 238-243
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1999 ◽
Vol 09
(PR8)
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pp. Pr8-613-Pr8-620
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2008 ◽
Vol 20
(S1)
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pp. 441-445
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2001 ◽
Vol 70
(2)
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pp. 191-196
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2013 ◽
Vol 29
(9)
◽
pp. 830-834
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2004 ◽
Vol 43
(10)
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pp. 6920-6924
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