Synthesis of aluminum oxide thin films: Use of aluminum tris‐dipivaloylmethanate as a new low pressure metal organic chemical vapor deposition precursor

1995 ◽  
Vol 67 (11) ◽  
pp. 1624-1626 ◽  
Author(s):  
E. Ciliberto ◽  
I. Fragalà ◽  
R. Rizza ◽  
G. Spoto ◽  
G. C. Allen
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