An array of inductively coupled plasma sources for large area plasma

1999 ◽  
Vol 355-356 ◽  
pp. 252-255 ◽  
Author(s):  
Se-Geun Park ◽  
Chul Kim ◽  
Beom-hoan O
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Plasma Sources ◽  
Inductively Coupled

Development of multiple inductively coupled plasma sources using coaxial transmission line for large-area processes

2016 ◽  
Vol 16 (3) ◽  
pp. 415-420
Author(s):  
Jin-Won Lee ◽  
Sang-Hyuk An ◽  
J.H. Kim ◽  
Yun-Seong Lee ◽  
Hong-Young Chang
Keyword(s):  
Transmission Line ◽  
Inductively Coupled Plasma ◽  
Large Area ◽  
Plasma Sources ◽  
Inductively Coupled

On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

2014 ◽  
Vol 21 (8) ◽  
pp. 083502 ◽  
Author(s):  
Jin-Won Lee ◽  
Yun-Seong Lee ◽  
Hong-Young Chang ◽  
Sang-Hyuk An
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Area ◽  
Helicon Plasma ◽  
Plasma Sources ◽  
Inductively Coupled

Low Inductance Antenna (LIA) plasma source and plasma-enhanced dual rotatable magnetron sputter assisted with LIA

2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa
Keyword(s):  
Inductively Coupled Plasma ◽  
Low Voltage ◽  
Polymer Surface ◽  
Plasma Source ◽  
Large Area ◽  
Plasma Damage ◽  
Inductively Coupled ◽  
Temperature Deposition ◽  
Magnetron Sputter ◽  
Plasma Profile

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.

Nonlinear enhancement of plasma density in linear combination of multiple collisional internal inductively coupled plasma sources

2010 ◽  
Vol 17 (10) ◽  
pp. 103503 ◽  
Author(s):  
Zhipeng Chen ◽  
Hong Li ◽  
Bin Li ◽  
Chen Luo ◽  
Jinlin Xie ◽  
...  
Keyword(s):  
Linear Combination ◽  
Plasma Density ◽  
Inductively Coupled Plasma ◽  
Plasma Sources ◽  
Inductively Coupled
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