Molecular dynamics simulation of gel formation and acid diffusion in negative tone chemically amplified resists

1999 ◽  
Vol 46 (1-4) ◽  
pp. 359-363 ◽  
Author(s):  
G.P. Patsis ◽  
N. Glezos
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Dynamics Simulation ◽  
Gel Formation ◽  
Acid Diffusion ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

Coarse-Grained Molecular Dynamics Simulation of Epoxy-Based Chemically-Amplified Resist for MEMS Application

2012 ◽  
Vol 1415 ◽  
Author(s):  
Hiromasa Yagyu ◽  
Yoshikazu Hirai ◽  
Akio Uesugi ◽  
Yoshihide Makino ◽  
Koji Sugano ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Dynamics Simulation ◽  
Coarse Grained ◽  
Cross Linking ◽  
Spring Model ◽  
Chemically Amplified ◽  
Calculation Step ◽  
Chemically Amplified Resist ◽  
Coarse Grained Molecular Dynamics

ABSTRACTA unique simulation method of epoxy-based chemically-amplified resist by coarse-grained molecular dynamics was proposed. The mechanical properties of an epoxy-based chemically-amplified resists with various cross-linking ratios were simulated using a newly developed coarse-grained molecular dynamics simulation that employs a bead-spring model. Models with the different cross-linking ratios were created in the molecular dynamics calculation step and uniaxial elongation simulations were performed. The results reveal that the simulated elastic modulus of the resist modeled by the bead-spring model with an extended angle bending potential depends on the cross-linking ratio; its dependency exhibits good agreement with that determined by nanoindentation tests.

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